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Title: Nanofabrication

Abstract

Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.

Inventors:
; ; ;
Issue Date:
Research Org.:
University of Massachusetts, Boston, MA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1176141
Patent Number(s):
7189435
Application Number:
10/098,222
Assignee:
University of Massachusetts (Boston, MA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
FG02-96ERA45612
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE

Citation Formats

Tuominen, Mark, Bal, Mustafa, Russell, Thomas P., and Ursache, Andrei. Nanofabrication. United States: N. p., 2007. Web.
Tuominen, Mark, Bal, Mustafa, Russell, Thomas P., & Ursache, Andrei. Nanofabrication. United States.
Tuominen, Mark, Bal, Mustafa, Russell, Thomas P., and Ursache, Andrei. Tue . "Nanofabrication". United States. https://www.osti.gov/servlets/purl/1176141.
@article{osti_1176141,
title = {Nanofabrication},
author = {Tuominen, Mark and Bal, Mustafa and Russell, Thomas P. and Ursache, Andrei},
abstractNote = {Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2007},
month = {3}
}

Patent:

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