Nanofabrication
Abstract
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
- Inventors:
- Issue Date:
- Research Org.:
- Univ. of Massachusetts, Amherst, MA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1176141
- Patent Number(s):
- 7189435
- Application Number:
- 10/098,222
- Assignee:
- University of Massachusetts (Boston, MA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- FG02-96ERA45612; DMR-9809365; CTS-9871782
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2002 Mar 14
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE
Citation Formats
Tuominen, Mark, Bal, Mustafa, Russell, Thomas P., and Ursache, Andrei. Nanofabrication. United States: N. p., 2007.
Web.
Tuominen, Mark, Bal, Mustafa, Russell, Thomas P., & Ursache, Andrei. Nanofabrication. United States.
Tuominen, Mark, Bal, Mustafa, Russell, Thomas P., and Ursache, Andrei. Tue .
"Nanofabrication". United States. https://www.osti.gov/servlets/purl/1176141.
@article{osti_1176141,
title = {Nanofabrication},
author = {Tuominen, Mark and Bal, Mustafa and Russell, Thomas P. and Ursache, Andrei},
abstractNote = {Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2007},
month = {3}
}
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