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Title: Method for in-situ cleaning of carbon contaminated surfaces

Abstract

Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled. A method of removing carbon contaminants from a substrate surface that is housed within a vacuum chamber is also disclosed. The method employs activated gaseous species that react with the carbon contaminants to form carbon containing gaseous byproducts.

Inventors:
; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1176020
Patent Number(s):
7147722
Application Number:
10/852,545
Assignee:
EUV LLC (Santa Clara, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Klebanoff, Leonard E., Grunow, Philip, and Graham, Jr., Samuel. Method for in-situ cleaning of carbon contaminated surfaces. United States: N. p., 2006. Web.
Klebanoff, Leonard E., Grunow, Philip, & Graham, Jr., Samuel. Method for in-situ cleaning of carbon contaminated surfaces. United States.
Klebanoff, Leonard E., Grunow, Philip, and Graham, Jr., Samuel. Tue . "Method for in-situ cleaning of carbon contaminated surfaces". United States. https://www.osti.gov/servlets/purl/1176020.
@article{osti_1176020,
title = {Method for in-situ cleaning of carbon contaminated surfaces},
author = {Klebanoff, Leonard E. and Grunow, Philip and Graham, Jr., Samuel},
abstractNote = {Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled. A method of removing carbon contaminants from a substrate surface that is housed within a vacuum chamber is also disclosed. The method employs activated gaseous species that react with the carbon contaminants to form carbon containing gaseous byproducts.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2006},
month = {12}
}

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Works referenced in this record:

Reactions of carbon with carbon dioxide activated by low voltage electrons
journal, July 1964


The Activation of Oxygen by Electron Impact
journal, August 1929