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Title: Ion source with external RF antenna

Abstract

A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An external RF antenna assembly is used to mount the external RF antenna to the ion source. The RF antenna tubing is wound around the external RF antenna assembly to form a coil. The external RF antenna assembly is formed of a material, e.g. quartz, which is essentially transparent to the RF waves. The external RF antenna assembly is attached to and forms a part of the plasma source chamber so that the RF waves emitted by the RF antenna enter into the inside of the plasma chamber and ionize a gas contained therein. The plasma ion source is typically a multi-cusp ion source.

Inventors:
; ;
Issue Date:
Research Org.:
Univ. of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175581
Patent Number(s):
6975072
Application Number:
10/443,575
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Leung, Ka-Ngo, Ji, Qing, and Wilde, Stephen. Ion source with external RF antenna. United States: N. p., 2005. Web.
Leung, Ka-Ngo, Ji, Qing, & Wilde, Stephen. Ion source with external RF antenna. United States.
Leung, Ka-Ngo, Ji, Qing, and Wilde, Stephen. Tue . "Ion source with external RF antenna". United States. https://www.osti.gov/servlets/purl/1175581.
@article{osti_1175581,
title = {Ion source with external RF antenna},
author = {Leung, Ka-Ngo and Ji, Qing and Wilde, Stephen},
abstractNote = {A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An external RF antenna assembly is used to mount the external RF antenna to the ion source. The RF antenna tubing is wound around the external RF antenna assembly to form a coil. The external RF antenna assembly is formed of a material, e.g. quartz, which is essentially transparent to the RF waves. The external RF antenna assembly is attached to and forms a part of the plasma source chamber so that the RF waves emitted by the RF antenna enter into the inside of the plasma chamber and ionize a gas contained therein. The plasma ion source is typically a multi-cusp ion source.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {12}
}

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Works referenced in this record:

A neutron tube with constant output (1010 n/sec) for activation analysis and reactor applications
journal, March 1965