Direct-patterned optical waveguides on amorphous silicon films
Abstract
An optical waveguide structure is formed by embedding a core material within a medium of lower refractive index, i.e. the cladding. The optical index of refraction of amorphous silicon (a-Si) and polycrystalline silicon (p-Si), in the wavelength range between about 1.2 and about 1.6 micrometers, differ by up to about 20%, with the amorphous phase having the larger index. Spatially selective laser crystallization of amorphous silicon provides a mechanism for controlling the spatial variation of the refractive index and for surrounding the amorphous regions with crystalline material. In cases where an amorphous silicon film is interposed between layers of low refractive index, for example, a structure comprised of a SiO.sub.2 substrate, a Si film and an SiO.sub.2 film, the formation of guided wave structures is particularly simple.
- Inventors:
- Issue Date:
- Research Org.:
- Univ. of California, Oakland, CA (United States); Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1175452
- Patent Number(s):
- 6925216
- Application Number:
- 10/676,876
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Vernon, Steve, Bond, Tiziana C., Bond, Steven W., Pocha, Michael D., and Hau-Riege, Stefan. Direct-patterned optical waveguides on amorphous silicon films. United States: N. p., 2005.
Web.
Vernon, Steve, Bond, Tiziana C., Bond, Steven W., Pocha, Michael D., & Hau-Riege, Stefan. Direct-patterned optical waveguides on amorphous silicon films. United States.
Vernon, Steve, Bond, Tiziana C., Bond, Steven W., Pocha, Michael D., and Hau-Riege, Stefan. Tue .
"Direct-patterned optical waveguides on amorphous silicon films". United States. https://www.osti.gov/servlets/purl/1175452.
@article{osti_1175452,
title = {Direct-patterned optical waveguides on amorphous silicon films},
author = {Vernon, Steve and Bond, Tiziana C. and Bond, Steven W. and Pocha, Michael D. and Hau-Riege, Stefan},
abstractNote = {An optical waveguide structure is formed by embedding a core material within a medium of lower refractive index, i.e. the cladding. The optical index of refraction of amorphous silicon (a-Si) and polycrystalline silicon (p-Si), in the wavelength range between about 1.2 and about 1.6 micrometers, differ by up to about 20%, with the amorphous phase having the larger index. Spatially selective laser crystallization of amorphous silicon provides a mechanism for controlling the spatial variation of the refractive index and for surrounding the amorphous regions with crystalline material. In cases where an amorphous silicon film is interposed between layers of low refractive index, for example, a structure comprised of a SiO.sub.2 substrate, a Si film and an SiO.sub.2 film, the formation of guided wave structures is particularly simple.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {8}
}
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