Individually addressable cathodes with integrated focusing stack or detectors

Thomas, Clarence E.; Baylor, Larry R.; Voelkl, Edgar; Simpson, Michael L.; Paulus, Michael J.; Lowndes, Douglas; Whealton, John; Whitson, John C.; Wilgen, John B.

Title: Individually addressable cathodes with integrated focusing stack or detectors

Abstract

Systems and method are described for addressable field emission array (AFEA) chips. A plurality of individually addressable cathodes are integrated with an electrostatic focusing stack and/or a plurality of detectors on the addressable field emission array. The systems and methods provide advantages including the avoidance of space-charge blow-up.

Inventors:: Thomas, Clarence E.; Baylor, Larry R.; Voelkl, Edgar; Simpson, Michael L.; Paulus, Michael J.; Lowndes, Douglas; Whealton, John; Whitson, John C.; Wilgen, John B.

Issue Date:: 2005-07-12

Research Org.:: UT-Battelle LLC, Oak Ridge, TN (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1175423

Patent Number(s):: 6917043

Application Number:: 10/260,321

Assignee:: UT-Battelle LLC (Oak Ridge, TN)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS

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B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
B82Y10/00 - Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
B82Y40/00 - Manufacture or treatment of nanostructures

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J2237/0635 - Multiple source, e.g. comb or array
H01J2237/31786 - Field-emitting cathode
H01J3/021 - {Electron guns using a field emission, photo emission, or secondary emission electron source}
H01J37/073 - Electron guns using field emission, photo emission, or secondary emission electron sources
H01J37/3174 - {Particle-beam lithography, e.g. electron beam lithography}
H01J37/3175 - {Projection methods, i.e. transfer substantially complete pattern to substrate}
H01J37/3177 - {Multi-beam, e.g. fly's eye, comb probe}

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Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 42 ENGINEERING

Citation Formats


                    Thomas, Clarence E., Baylor, Larry R., Voelkl, Edgar, Simpson, Michael L., Paulus, Michael J., Lowndes, Douglas, Whealton, John, Whitson, John C., and Wilgen, John B.. Individually addressable cathodes with integrated focusing stack or detectors.  United States: N. p., 2005. 
        Web.

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                    Thomas, Clarence E., Baylor, Larry R., Voelkl, Edgar, Simpson, Michael L., Paulus, Michael J., Lowndes, Douglas, Whealton, John, Whitson, John C., & Wilgen, John B.. Individually addressable cathodes with integrated focusing stack or detectors.  United States.

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                    Thomas, Clarence E., Baylor, Larry R., Voelkl, Edgar, Simpson, Michael L., Paulus, Michael J., Lowndes, Douglas, Whealton, John, Whitson, John C., and Wilgen, John B.. Tue .  
        "Individually addressable cathodes with integrated focusing stack or detectors".  United States.  https://www.osti.gov/servlets/purl/1175423.

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@article{osti_1175423,

  title        = {Individually addressable cathodes with integrated focusing stack or detectors},

  author       = {Thomas, Clarence E. and Baylor, Larry R. and Voelkl, Edgar and Simpson, Michael L. and Paulus, Michael J. and Lowndes, Douglas and Whealton, John and Whitson, John C. and Wilgen, John B.},

  abstractNote = {Systems and method are described for addressable field emission array (AFEA) chips. A plurality of individually addressable cathodes are integrated with an electrostatic focusing stack and/or a plurality of detectors on the addressable field emission array. The systems and methods provide advantages including the avoidance of space-charge blow-up.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2005},

  month        = {7}

}

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Works referenced in this record:

X-ray lithography for ≤100 nm ground rules in complex patterns
journal, November 1997

Hector, Scott
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 15, Issue 6
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EL5: One tool for advanced x-ray and chrome on glass mask making
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Sturans, M. A.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6
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Miniaturized e-beam writer: Testing of components
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Chang, T. H. P.; Thomson, M. G. R.; Yu, M. L.
Microelectronic Engineering, Vol. 32, Issue 1-4
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A review of ion projection lithography
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Melngailis, J.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 3
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Scattering with angular limitation projection electron beam lithography for suboptical lithography
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Harriott, Lloyd R.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 15, Issue 6
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Electron-beam microcolumns for lithography and related applications
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Arrayed miniature electron beam columns for high throughput sub-100 nm lithography
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Chang, T. H. P.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 10, Issue 6
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Extreme ultraviolet lithography
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Gwyn, C. W.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6
https://doi.org/10.1116/1.590453

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Title: Individually addressable cathodes with integrated focusing stack or detectors

Abstract

Citation Formats

X-ray lithography for ≤100 nm ground rules in complex patterns journal, November 1997

EL5: One tool for advanced x-ray and chrome on glass mask making journal, November 1998

Miniaturized e-beam writer: Testing of components journal, February 1995

Electron beam technology—SEM to microcolumn journal, September 1996

A review of ion projection lithography journal, May 1998

Scattering with angular limitation projection electron beam lithography for suboptical lithography journal, November 1997

Electron-beam microcolumns for lithography and related applications journal, November 1996

Arrayed miniature electron beam columns for high throughput sub-100 nm lithography journal, November 1992

Extreme ultraviolet lithography journal, November 1998

X-ray lithography for ≤100 nm ground rules in complex patterns
journal, November 1997

EL5: One tool for advanced x-ray and chrome on glass mask making
journal, November 1998

Miniaturized e-beam writer: Testing of components
journal, February 1995

Electron beam technology—SEM to microcolumn
journal, September 1996

A review of ion projection lithography
journal, May 1998

Scattering with angular limitation projection electron beam lithography for suboptical lithography
journal, November 1997

Electron-beam microcolumns for lithography and related applications
journal, November 1996

Arrayed miniature electron beam columns for high throughput sub-100 nm lithography
journal, November 1992

Extreme ultraviolet lithography
journal, November 1998