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Title: Vapor-deposited porous films for energy conversion

Abstract

Metallic films are grown with a "spongelike" morphology in the as-deposited condition using planar magnetron sputtering. The morphology of the deposit is characterized by metallic continuity in three dimensions with continuous and open porosity on the submicron scale. The stabilization of the spongelike morphology is found over a limited range of the sputter deposition parameters, that is, of working gas pressure and substrate temperature. This spongelike morphology is an extension of the features as generally represented in the classic zone models of growth for physical vapor deposits. Nickel coatings were deposited with working gas pressures up 4 Pa and for substrate temperatures up to 1000 K. The morphology of the deposits is examined in plan and in cross section views with scanning electron microscopy (SEM). The parametric range of gas pressure and substrate temperature (relative to absolute melt point) under which the spongelike metal deposits are produced appear universal for other metals including gold, silver, and aluminum.

Inventors:
; ;
Issue Date:
Research Org.:
Univ. of California, Oakland, CA (United States); Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175417
Patent Number(s):
6913998
Application Number:
10/612,177
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01M - PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Jankowski, Alan F., Hayes, Jeffrey P., and Morse, Jeffrey D. Vapor-deposited porous films for energy conversion. United States: N. p., 2005. Web.
Jankowski, Alan F., Hayes, Jeffrey P., & Morse, Jeffrey D. Vapor-deposited porous films for energy conversion. United States.
Jankowski, Alan F., Hayes, Jeffrey P., and Morse, Jeffrey D. Tue . "Vapor-deposited porous films for energy conversion". United States. https://www.osti.gov/servlets/purl/1175417.
@article{osti_1175417,
title = {Vapor-deposited porous films for energy conversion},
author = {Jankowski, Alan F. and Hayes, Jeffrey P. and Morse, Jeffrey D.},
abstractNote = {Metallic films are grown with a "spongelike" morphology in the as-deposited condition using planar magnetron sputtering. The morphology of the deposit is characterized by metallic continuity in three dimensions with continuous and open porosity on the submicron scale. The stabilization of the spongelike morphology is found over a limited range of the sputter deposition parameters, that is, of working gas pressure and substrate temperature. This spongelike morphology is an extension of the features as generally represented in the classic zone models of growth for physical vapor deposits. Nickel coatings were deposited with working gas pressures up 4 Pa and for substrate temperatures up to 1000 K. The morphology of the deposits is examined in plan and in cross section views with scanning electron microscopy (SEM). The parametric range of gas pressure and substrate temperature (relative to absolute melt point) under which the spongelike metal deposits are produced appear universal for other metals including gold, silver, and aluminum.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {7}
}

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Works referenced in this record:

Micromachined reactors for catalytic partial oxidation reactions
journal, November 1997


Sputter deposition of cermet fuel electrodes for solid oxide fuel cells
journal, May 1995


Experimental system for the study of gas-solid heterogeneous catalysis in microreactors
conference, August 2000