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Title: Reel-to-reel substrate tape polishing system

Abstract

Disclosed is a reel-to-reel single-pass mechanical polishing system (100) suitable for polishing long lengths of metal substrate tape (124) used in the manufacture of high-temperature superconductor (HTS) coated tape, including multiple instantiations of a polishing station (114) in combination with a subsequent rinsing station (116) arranged along the axis of the metal substrate tape (124) that is translating between a payout spool (110a) and a take-up spool (110b). The metal substrate tape obtains a surface smoothness that is suitable for the subsequent deposition of a buffer layer.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
Superpower, Inc., Schenectady, NY (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175398
Patent Number(s):
6908362
Application Number:
10/469,071
Assignee:
Superpower, Inc.
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B24 - GRINDING B24B - MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Selvamanickam, Venkat, Gardner, Michael T., Judd, Raymond D., Weloth, Martin, and Qiao, Yunfei. Reel-to-reel substrate tape polishing system. United States: N. p., 2005. Web.
Selvamanickam, Venkat, Gardner, Michael T., Judd, Raymond D., Weloth, Martin, & Qiao, Yunfei. Reel-to-reel substrate tape polishing system. United States.
Selvamanickam, Venkat, Gardner, Michael T., Judd, Raymond D., Weloth, Martin, and Qiao, Yunfei. Tue . "Reel-to-reel substrate tape polishing system". United States. https://www.osti.gov/servlets/purl/1175398.
@article{osti_1175398,
title = {Reel-to-reel substrate tape polishing system},
author = {Selvamanickam, Venkat and Gardner, Michael T. and Judd, Raymond D. and Weloth, Martin and Qiao, Yunfei},
abstractNote = {Disclosed is a reel-to-reel single-pass mechanical polishing system (100) suitable for polishing long lengths of metal substrate tape (124) used in the manufacture of high-temperature superconductor (HTS) coated tape, including multiple instantiations of a polishing station (114) in combination with a subsequent rinsing station (116) arranged along the axis of the metal substrate tape (124) that is translating between a payout spool (110a) and a take-up spool (110b). The metal substrate tape obtains a surface smoothness that is suitable for the subsequent deposition of a buffer layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {6}
}