skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Method for the fabrication of three-dimensional microstructures by deep X-ray lithography

Abstract

A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.

Inventors:
;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175306
Patent Number(s):
6875544
Application Number:
10/264,536
Assignee:
Sandia Corporation
Patent Classifications (CPCs):
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Sweatt, William C., and Christenson, Todd R. Method for the fabrication of three-dimensional microstructures by deep X-ray lithography. United States: N. p., 2005. Web.
Sweatt, William C., & Christenson, Todd R. Method for the fabrication of three-dimensional microstructures by deep X-ray lithography. United States.
Sweatt, William C., and Christenson, Todd R. Tue . "Method for the fabrication of three-dimensional microstructures by deep X-ray lithography". United States. https://www.osti.gov/servlets/purl/1175306.
@article{osti_1175306,
title = {Method for the fabrication of three-dimensional microstructures by deep X-ray lithography},
author = {Sweatt, William C. and Christenson, Todd R.},
abstractNote = {A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {4}
}

Patent:

Save / Share:

Works referenced in this record:

Fabrication of photonic crystals by deep x-ray lithography
journal, September 1997


40 keV shaped electron beam lithography for LIGA intermediate mask fabrication
journal, May 1999


Fabrication of three-dimensional photonic structures with submicrometer resolution by x-ray lithography
journal, January 2000

  • Cuisin, C.; Chelnokov, A.; Lourtioz, J. -M.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 18, Issue 6
  • https://doi.org/10.1116/1.1319825

Recent developments in deep x-ray lithography
journal, November 1998


Photonic band structure: The face-centered-cubic case employing nonspherical atoms
journal, October 1991


Submicrometer resolution Yablonovite templates fabricated by x-ray lithography
journal, August 2000


High precision mask fabrication for deep X-ray lithography using 40-kV shaped electron beam lithography
journal, September 2001


A tetrahedral three-facet micro mirror with the inclined deep X-ray process
journal, September 2001


Materials of LIGA technology
journal, February 1999


Fabrication of three-dimensional microstructures by high resolution x-ray lithography
journal, January 1999

  • Cuisin, C.; Chen, Y.; Decanini, D.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 17, Issue 6
  • https://doi.org/10.1116/1.591027