Method for the fabrication of three-dimensional microstructures by deep X-ray lithography
Abstract
A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1175306
- Patent Number(s):
- 6875544
- Application Number:
- 10/264,536
- Assignee:
- Sandia Corporation
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Sweatt, William C., and Christenson, Todd R. Method for the fabrication of three-dimensional microstructures by deep X-ray lithography. United States: N. p., 2005.
Web.
Sweatt, William C., & Christenson, Todd R. Method for the fabrication of three-dimensional microstructures by deep X-ray lithography. United States.
Sweatt, William C., and Christenson, Todd R. Tue .
"Method for the fabrication of three-dimensional microstructures by deep X-ray lithography". United States. https://www.osti.gov/servlets/purl/1175306.
@article{osti_1175306,
title = {Method for the fabrication of three-dimensional microstructures by deep X-ray lithography},
author = {Sweatt, William C. and Christenson, Todd R.},
abstractNote = {A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {4}
}
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