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Title: Spatially controlled, in situ synthesis of polymers

Abstract

An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.

Inventors:
; ; ;
Issue Date:
Research Org.:
Univ. of Chicago, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175284
Patent Number(s):
6869983
Application Number:
10/458,344
Assignee:
University Of Chicago
Patent Classifications (CPCs):
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08F - MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
DOE Contract Number:  
W-31-109-ENG-38
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Caneba, Gerard T., Tirumala, Vijaya Raghavan, Mancini, Derrick C., and Wang, Hsien-Hau. Spatially controlled, in situ synthesis of polymers. United States: N. p., 2005. Web.
Caneba, Gerard T., Tirumala, Vijaya Raghavan, Mancini, Derrick C., & Wang, Hsien-Hau. Spatially controlled, in situ synthesis of polymers. United States.
Caneba, Gerard T., Tirumala, Vijaya Raghavan, Mancini, Derrick C., and Wang, Hsien-Hau. Tue . "Spatially controlled, in situ synthesis of polymers". United States. https://www.osti.gov/servlets/purl/1175284.
@article{osti_1175284,
title = {Spatially controlled, in situ synthesis of polymers},
author = {Caneba, Gerard T. and Tirumala, Vijaya Raghavan and Mancini, Derrick C. and Wang, Hsien-Hau},
abstractNote = {An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {3}
}

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