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Title: Method of fabricating reflection-mode EUV diffusers

Abstract

Techniques for fabricating well-controlled, random relief, engineered surfaces that serve as substrates for EUV optical devices are accomplished with grayscale exposure. The method of fabricating a multilevel EUV optical element includes: (a) providing a substrate; (b) depositing a layer of curable material on a surface of the substrate; (c) creating a relief profile in a layer of cured material from the layer of curable material wherein the relief profile comprises multiple levels of cured material that has a defined contour; and (d) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. The curable material can comprise photoresist or a low dielectric constant material.

Inventors:
;
Issue Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175256
Patent Number(s):
6861273
Application Number:
09/846,150
Assignee:
EUV LLC (Santa Clara, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Anderson, Erik, and Naulleau, Patrick P. Method of fabricating reflection-mode EUV diffusers. United States: N. p., 2005. Web.
Anderson, Erik, & Naulleau, Patrick P. Method of fabricating reflection-mode EUV diffusers. United States.
Anderson, Erik, and Naulleau, Patrick P. Tue . "Method of fabricating reflection-mode EUV diffusers". United States. https://www.osti.gov/servlets/purl/1175256.
@article{osti_1175256,
title = {Method of fabricating reflection-mode EUV diffusers},
author = {Anderson, Erik and Naulleau, Patrick P.},
abstractNote = {Techniques for fabricating well-controlled, random relief, engineered surfaces that serve as substrates for EUV optical devices are accomplished with grayscale exposure. The method of fabricating a multilevel EUV optical element includes: (a) providing a substrate; (b) depositing a layer of curable material on a surface of the substrate; (c) creating a relief profile in a layer of cured material from the layer of curable material wherein the relief profile comprises multiple levels of cured material that has a defined contour; and (d) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. The curable material can comprise photoresist or a low dielectric constant material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {3}
}

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