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Title: Apparatus for generating partially coherent radiation

Abstract

Techniques for generating partially coherent radiation and particularly for converting effectively coherent radiation from a synchrotron to partially coherent EUV radiation suitable for projection lithography.

Inventors:
Issue Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175247
Patent Number(s):
6859263
Application Number:
10/377,947
Assignee:
EUV LLC (Santa Clara, CA)
Patent Classifications (CPCs):
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
07 ISOTOPE AND RADIATION SOURCES

Citation Formats

Naulleau, Patrick P. Apparatus for generating partially coherent radiation. United States: N. p., 2005. Web.
Naulleau, Patrick P. Apparatus for generating partially coherent radiation. United States.
Naulleau, Patrick P. Tue . "Apparatus for generating partially coherent radiation". United States. https://www.osti.gov/servlets/purl/1175247.
@article{osti_1175247,
title = {Apparatus for generating partially coherent radiation},
author = {Naulleau, Patrick P.},
abstractNote = {Techniques for generating partially coherent radiation and particularly for converting effectively coherent radiation from a synchrotron to partially coherent EUV radiation suitable for projection lithography.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {2}
}

Patent:

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Works referenced in this record:

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998

  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309563

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998

  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309563

Modification of the coherence of undulator radiation
journal, February 1995