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Title: Decal transfer microfabrication

Abstract

A method of making a microstructure includes forming a pattern in a surface of a silicon-containing elastomer, oxidizing the pattern, contacting the pattern with a substrate; and bonding the oxidized pattern and the substrate such that the pattern and the substrate are irreversibly attached. The silicon-containing elastomer may be removably attached to a transfer pad.

Inventors:
;
Issue Date:
Research Org.:
Univ. of Illinois at Urbana-Champaign, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175080
Patent Number(s):
6805809
Application Number:
10/230,882
Assignee:
Board of Trustees of University of Illinois (Urbana, IL)
Patent Classifications (CPCs):
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
DOE Contract Number:  
FG02-91ER45439
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Nuzzo, Ralph G., and Childs, William Robert. Decal transfer microfabrication. United States: N. p., 2004. Web.
Nuzzo, Ralph G., & Childs, William Robert. Decal transfer microfabrication. United States.
Nuzzo, Ralph G., and Childs, William Robert. Tue . "Decal transfer microfabrication". United States. https://www.osti.gov/servlets/purl/1175080.
@article{osti_1175080,
title = {Decal transfer microfabrication},
author = {Nuzzo, Ralph G. and Childs, William Robert},
abstractNote = {A method of making a microstructure includes forming a pattern in a surface of a silicon-containing elastomer, oxidizing the pattern, contacting the pattern with a substrate; and bonding the oxidized pattern and the substrate such that the pattern and the substrate are irreversibly attached. The silicon-containing elastomer may be removably attached to a transfer pad.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {10}
}

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Works referenced in this record:

High-performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins/maleic anhydride
conference, June 2000


Prototyping of Masks, Masters, and Stamps/Molds for Soft Lithography Using an Office Printer and Photographic Reduction
journal, July 2000


Soft Lithography
journal, August 1998


Using Patterns in Microfiche as Photomasks in 10-μm-Scale Microfabrication
journal, September 1999


Conversion of Some Siloxane Polymers to Silicon Oxide by UV/Ozone Photochemical Processes
journal, June 2000