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Title: Apparatus for generating partially coherent radiation

Abstract

The effective coherence of an undulator beamline can be tailored to projection lithography requirements by using a simple single moving element and a simple stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (i) source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence; (ii) a reflective surface that receives incident radiation from said source; (iii) means for moving the reflective surface through a desired range of angles in two dimensions wherein the rate of the motion is fast relative to integration time of said image processing system; and (iv) a condenser optic that re-images the moving reflective surface to the entrance plane of said image processing system, thereby, making the illumination spot in said entrance plane essentially stationary.

Inventors:
Issue Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175058
Patent Number(s):
6798494
Application Number:
09/944,391
Assignee:
EUV LLC (Santa Clara, CA)
Patent Classifications (CPCs):
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Naulleau, Patrick P. Apparatus for generating partially coherent radiation. United States: N. p., 2004. Web.
Naulleau, Patrick P. Apparatus for generating partially coherent radiation. United States.
Naulleau, Patrick P. Tue . "Apparatus for generating partially coherent radiation". United States. https://www.osti.gov/servlets/purl/1175058.
@article{osti_1175058,
title = {Apparatus for generating partially coherent radiation},
author = {Naulleau, Patrick P.},
abstractNote = {The effective coherence of an undulator beamline can be tailored to projection lithography requirements by using a simple single moving element and a simple stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (i) source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence; (ii) a reflective surface that receives incident radiation from said source; (iii) means for moving the reflective surface through a desired range of angles in two dimensions wherein the rate of the motion is fast relative to integration time of said image processing system; and (iv) a condenser optic that re-images the moving reflective surface to the entrance plane of said image processing system, thereby, making the illumination spot in said entrance plane essentially stationary.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {9}
}

Patent:

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Works referenced in this record:

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998

  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309563

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998

  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309563

Modification of the coherence of undulator radiation
journal, February 1995