Synchrotron-based EUV lithography illuminator simulator
Abstract
A lithographic illuminator to illuminate a reticle to be imaged with a range of angles is provided. The illumination can be employed to generate a pattern in the pupil of the imaging system, where spatial coordinates in the pupil plane correspond to illumination angles in the reticle plane. In particular, a coherent synchrotron beamline is used along with a potentially decoherentizing holographic optical element (HOE), as an experimental EUV illuminator simulation station. The pupil fill is completely defined by a single HOE, thus the system can be easily modified to model a variety of illuminator fill patterns. The HOE can be designed to generate any desired angular spectrum and such a device can serve as the basis for an illuminator simulator.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1174963
- Patent Number(s):
- 6768567
- Application Number:
- 10/163,479
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 47 OTHER INSTRUMENTATION
Citation Formats
Naulleau, Patrick P. Synchrotron-based EUV lithography illuminator simulator. United States: N. p., 2004.
Web.
Naulleau, Patrick P. Synchrotron-based EUV lithography illuminator simulator. United States.
Naulleau, Patrick P. Tue .
"Synchrotron-based EUV lithography illuminator simulator". United States. https://www.osti.gov/servlets/purl/1174963.
@article{osti_1174963,
title = {Synchrotron-based EUV lithography illuminator simulator},
author = {Naulleau, Patrick P.},
abstractNote = {A lithographic illuminator to illuminate a reticle to be imaged with a range of angles is provided. The illumination can be employed to generate a pattern in the pupil of the imaging system, where spatial coordinates in the pupil plane correspond to illumination angles in the reticle plane. In particular, a coherent synchrotron beamline is used along with a potentially decoherentizing holographic optical element (HOE), as an experimental EUV illuminator simulation station. The pupil fill is completely defined by a single HOE, thus the system can be easily modified to model a variety of illuminator fill patterns. The HOE can be designed to generate any desired angular spectrum and such a device can serve as the basis for an illuminator simulator.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jul 27 00:00:00 EDT 2004},
month = {Tue Jul 27 00:00:00 EDT 2004}
}
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Application Of Local Reference Beam Holography To The Study Of Laser Beam Parameters
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