Focused electron and ion beam systems
Abstract
An electron beam system is based on a plasma generator in a plasma ion source with an accelerator column. The electrons are extracted from a plasma cathode in a plasma ion source, e.g. a multicusp plasma ion source. The beam can be scanned in both the x and y directions, and the system can be operated with multiple beamlets. A compact focused ion or electron beam system has a plasma ion source and an all-electrostatic beam acceleration and focusing column. The ion source is a small chamber with the plasma produced by radio-frequency (RF) induction discharge. The RF antenna is wound outside the chamber and connected to an RF supply. Ions or electrons can be extracted from the source. A multi-beam system has several sources of different species and an electron beam source.
- Inventors:
- Issue Date:
- Research Org.:
- Univ. of California, Oakland, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1174962
- Patent Number(s):
- 6768120
- Application Number:
- 10/232,502
- Assignee:
- University Of California, The Regents Of
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 70 PLASMA PHYSICS AND FUSION TECHNOLOGY
Citation Formats
Leung, Ka-Ngo, Reijonen, Jani, Persaud, Arun, Ji, Qing, and Jiang, Ximan. Focused electron and ion beam systems. United States: N. p., 2004.
Web.
Leung, Ka-Ngo, Reijonen, Jani, Persaud, Arun, Ji, Qing, & Jiang, Ximan. Focused electron and ion beam systems. United States.
Leung, Ka-Ngo, Reijonen, Jani, Persaud, Arun, Ji, Qing, and Jiang, Ximan. Tue .
"Focused electron and ion beam systems". United States. https://www.osti.gov/servlets/purl/1174962.
@article{osti_1174962,
title = {Focused electron and ion beam systems},
author = {Leung, Ka-Ngo and Reijonen, Jani and Persaud, Arun and Ji, Qing and Jiang, Ximan},
abstractNote = {An electron beam system is based on a plasma generator in a plasma ion source with an accelerator column. The electrons are extracted from a plasma cathode in a plasma ion source, e.g. a multicusp plasma ion source. The beam can be scanned in both the x and y directions, and the system can be operated with multiple beamlets. A compact focused ion or electron beam system has a plasma ion source and an all-electrostatic beam acceleration and focusing column. The ion source is a small chamber with the plasma produced by radio-frequency (RF) induction discharge. The RF antenna is wound outside the chamber and connected to an RF supply. Ions or electrons can be extracted from the source. A multi-beam system has several sources of different species and an electron beam source.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {7}
}