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Title: Self-assembled monolayer and method of making

Abstract

According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

Inventors:
; ; ;
Issue Date:
Research Org.:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174840
Patent Number(s):
6733835
Application Number:
10/347,040
Assignee:
Battelle Memorial Institute (Richland, WA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Fryxell, Glen E., Zemanian, Thomas S., Liu, Jun, and Shin, Yongsoon. Self-assembled monolayer and method of making. United States: N. p., 2004. Web.
Fryxell, Glen E., Zemanian, Thomas S., Liu, Jun, & Shin, Yongsoon. Self-assembled monolayer and method of making. United States.
Fryxell, Glen E., Zemanian, Thomas S., Liu, Jun, and Shin, Yongsoon. Tue . "Self-assembled monolayer and method of making". United States. https://www.osti.gov/servlets/purl/1174840.
@article{osti_1174840,
title = {Self-assembled monolayer and method of making},
author = {Fryxell, Glen E. and Zemanian, Thomas S. and Liu, Jun and Shin, Yongsoon},
abstractNote = {According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {5}
}

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Works referenced in this record:

Supercritical processing of functionalized size selective microporous materials
journal, May 2000


Functionalized Monolayers on Ordered Mesoporous Supports
journal, May 1997