Discharge source with gas curtain for protecting optics from particles
Abstract
A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1174795
- Patent Number(s):
- 6714624
- Application Number:
- 09/956,275
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS
Citation Formats
Fornaciari, Neal R., and Kanouff, Michael P. Discharge source with gas curtain for protecting optics from particles. United States: N. p., 2004.
Web.
Fornaciari, Neal R., & Kanouff, Michael P. Discharge source with gas curtain for protecting optics from particles. United States.
Fornaciari, Neal R., and Kanouff, Michael P. Tue .
"Discharge source with gas curtain for protecting optics from particles". United States. https://www.osti.gov/servlets/purl/1174795.
@article{osti_1174795,
title = {Discharge source with gas curtain for protecting optics from particles},
author = {Fornaciari, Neal R. and Kanouff, Michael P.},
abstractNote = {A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {3}
}
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Works referenced in this record:
Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region
journal, January 1998
- Klosner, M. A.; Silfvast, W. T.
- Optics Letters, Vol. 23, Issue 20
Structure and low-temperature thermal conductivity of pyrolytic boron nitride
journal, August 1992
- Duclaux, L.; Nysten, B.; Issi, J-P.
- Physical Review B, Vol. 46, Issue 6
Compression Annealing of Pyrolytic Boron Nitride
journal, March 1969
- Moore, A. W.
- Nature, Vol. 221, Issue 5186
High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography
conference, June 1999
- Silfvast, William T.; Klosner, M.; Shimkaveg, Gregory M.
- Microlithography '99, SPIE Proceedings
High-power extreme-ultraviolet source based on gas jets
conference, June 1998
- Kubiak, Glenn D.; Bernardez II, Luis J.; Krenz, Kevin D.
- 23rd Annual International Symposium on Microlithography, SPIE Proceedings
Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography
conference, June 1998
- Mirkarimi, Paul B.; Montcalm, Claude
- 23rd Annual International Symposium on Microlithography, SPIE Proceedings
Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography
journal, January 1997
- Klosner, M. A.; Bender, H. A.; Silfvast, W. T.
- Optics Letters, Vol. 22, Issue 1