Self-cleaning optic for extreme ultraviolet lithography
Abstract
A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1174631
- Patent Number(s):
- 6664554
- Application Number:
- 09/754,869
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Klebanoff, Leonard E., and Stulen, Richard H. Self-cleaning optic for extreme ultraviolet lithography. United States: N. p., 2003.
Web.
Klebanoff, Leonard E., & Stulen, Richard H. Self-cleaning optic for extreme ultraviolet lithography. United States.
Klebanoff, Leonard E., and Stulen, Richard H. Tue .
"Self-cleaning optic for extreme ultraviolet lithography". United States. https://www.osti.gov/servlets/purl/1174631.
@article{osti_1174631,
title = {Self-cleaning optic for extreme ultraviolet lithography},
author = {Klebanoff, Leonard E. and Stulen, Richard H.},
abstractNote = {A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Dec 16 00:00:00 EST 2003},
month = {Tue Dec 16 00:00:00 EST 2003}
}
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