skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: System configured for applying multiple modifying agents to a substrate

Abstract

The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.

Inventors:
; ; ; ; ; ; ;
Issue Date:
Research Org.:
Idaho National Lab. (INL), Idaho Falls, ID (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174593
Patent Number(s):
6,652,654
Application Number:
09/671,459
Assignee:
Bechtel BWXT Idaho, LLC (Idaho Falls, ID) OSTI
DOE Contract Number:  
AC07-94ID13223
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Propp, W. Alan, Argyle, Mark D., Janikowski, Stuart K., Fox, Robert V., Toth, William J., Ginosar, Daniel M., Allen, Charles A., and Miller, David L. System configured for applying multiple modifying agents to a substrate. United States: N. p., 2003. Web.
Propp, W. Alan, Argyle, Mark D., Janikowski, Stuart K., Fox, Robert V., Toth, William J., Ginosar, Daniel M., Allen, Charles A., & Miller, David L. System configured for applying multiple modifying agents to a substrate. United States.
Propp, W. Alan, Argyle, Mark D., Janikowski, Stuart K., Fox, Robert V., Toth, William J., Ginosar, Daniel M., Allen, Charles A., and Miller, David L. Tue . "System configured for applying multiple modifying agents to a substrate". United States. https://www.osti.gov/servlets/purl/1174593.
@article{osti_1174593,
title = {System configured for applying multiple modifying agents to a substrate},
author = {Propp, W. Alan and Argyle, Mark D. and Janikowski, Stuart K. and Fox, Robert V. and Toth, William J. and Ginosar, Daniel M. and Allen, Charles A. and Miller, David L.},
abstractNote = {The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {11}
}

Patent:

Save / Share: