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Title: Volatile organometallic complexes suitable for use in chemical vapor depositions on metal oxide films

Abstract

Novel ligated compounds of tin, titanium, and zinc are useful as metal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.

Inventors:
Issue Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174514
Patent Number(s):
6,627,765
Application Number:
10/150,561
Assignee:
First Solar, LLC (Perrysburg, OH) OSTI
DOE Contract Number:  
AC36-98GO10337
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Giolando, Dean M. Volatile organometallic complexes suitable for use in chemical vapor depositions on metal oxide films. United States: N. p., 2003. Web.
Giolando, Dean M. Volatile organometallic complexes suitable for use in chemical vapor depositions on metal oxide films. United States.
Giolando, Dean M. Tue . "Volatile organometallic complexes suitable for use in chemical vapor depositions on metal oxide films". United States. https://www.osti.gov/servlets/purl/1174514.
@article{osti_1174514,
title = {Volatile organometallic complexes suitable for use in chemical vapor depositions on metal oxide films},
author = {Giolando, Dean M.},
abstractNote = {Novel ligated compounds of tin, titanium, and zinc are useful as metal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {9}
}

Patent:

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