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Title: CO2 laser and plasma microjet process for improving laser optics

Abstract

A optic is produced for operation at the fundamental Nd:YAG laser wavelength of 1.06 micrometers through the tripled Nd:YAG laser wavelength of 355 nanometers by the method of reducing or eliminating the growth of laser damage sites in the optics by processing the optics to stop damage in the optics from growing to a predetermined critical size. A system is provided of mitigating the growth of laser-induced damage in optics by virtue of very localized removal of glass and absorbing material.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
Univ. of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174489
Patent Number(s):
6620333
Application Number:
09/978,394
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
DOE Contract Number:  
W-7405-ENG48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY

Citation Formats

Brusasco, Raymond M., Penetrante, Bernardino M., Butler, James A., Grundler, Walter, and Governo, George K.. CO2 laser and plasma microjet process for improving laser optics. United States: N. p., 2003. Web.
Brusasco, Raymond M., Penetrante, Bernardino M., Butler, James A., Grundler, Walter, & Governo, George K.. CO2 laser and plasma microjet process for improving laser optics. United States.
Brusasco, Raymond M., Penetrante, Bernardino M., Butler, James A., Grundler, Walter, and Governo, George K.. Tue . "CO2 laser and plasma microjet process for improving laser optics". United States. https://www.osti.gov/servlets/purl/1174489.
@article{osti_1174489,
title = {CO2 laser and plasma microjet process for improving laser optics},
author = {Brusasco, Raymond M. and Penetrante, Bernardino M. and Butler, James A. and Grundler, Walter and Governo, George K.},
abstractNote = {A optic is produced for operation at the fundamental Nd:YAG laser wavelength of 1.06 micrometers through the tripled Nd:YAG laser wavelength of 355 nanometers by the method of reducing or eliminating the growth of laser damage sites in the optics by processing the optics to stop damage in the optics from growing to a predetermined critical size. A system is provided of mitigating the growth of laser-induced damage in optics by virtue of very localized removal of glass and absorbing material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {9}
}

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Works referenced in this record:

An Investigation of Laser Processing of Silica Surfaces
book, January 1988


Deposition of silicon dioxide films with an atmospheric-pressure plasma jet
journal, August 1998


Development and application of a microbeam plasma generator
journal, February 1992


Etching materials with an atmospheric-pressure plasma jet
journal, August 1998