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Title: Radiation source with shaped emission

Abstract

Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera.

Inventors:
;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174328
Patent Number(s):
6563907
Application Number:
10/005,600
Assignee:
EUV LLC (Santa Clara, CA)
Patent Classifications (CPCs):
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
07 ISOTOPE AND RADIATION SOURCES

Citation Formats

Kubiak, Glenn D., and Sweatt, William C. Radiation source with shaped emission. United States: N. p., 2003. Web.
Kubiak, Glenn D., & Sweatt, William C. Radiation source with shaped emission. United States.
Kubiak, Glenn D., and Sweatt, William C. Tue . "Radiation source with shaped emission". United States. https://www.osti.gov/servlets/purl/1174328.
@article{osti_1174328,
title = {Radiation source with shaped emission},
author = {Kubiak, Glenn D. and Sweatt, William C.},
abstractNote = {Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {5}
}

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Works referenced in this record:

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region
journal, January 1998


Structure and low-temperature thermal conductivity of pyrolytic boron nitride
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Compression Annealing of Pyrolytic Boron Nitride
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High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography
conference, June 1999


High-power extreme-ultraviolet source based on gas jets
conference, June 1998

  • Kubiak, Glenn D.; Bernardez II, Luis J.; Krenz, Kevin D.
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309560

Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography
conference, June 1998


Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography
journal, January 1997