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Title: Radiation source with shaped emission

Abstract

Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera.

Inventors:
;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174328
Patent Number(s):
6,563,907
Application Number:
10/005,600
Assignee:
EUV LLC (Santa Clara, CA) OSTI
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
07 ISOTOPE AND RADIATION SOURCES

Citation Formats

Kubiak, Glenn D., and Sweatt, William C. Radiation source with shaped emission. United States: N. p., 2003. Web.
Kubiak, Glenn D., & Sweatt, William C. Radiation source with shaped emission. United States.
Kubiak, Glenn D., and Sweatt, William C. Tue . "Radiation source with shaped emission". United States. https://www.osti.gov/servlets/purl/1174328.
@article{osti_1174328,
title = {Radiation source with shaped emission},
author = {Kubiak, Glenn D. and Sweatt, William C.},
abstractNote = {Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {5}
}

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