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Title: Method of fabricating a high aspect ratio microstructure

Abstract

The present invention is for a method of fabricating a high aspect ratio, freestanding microstructure. The fabrication method modifies the exposure process for SU-8, an negative-acting, ultraviolet-sensitive photoresist used for microfabrication whereby a UV-absorbent glass substrate, chosen for complete absorption of UV radiation at 380 nanometers or less, is coated with a negative photoresist, exposed and developed according to standard practice. This UV absorbent glass enables the fabrication of cylindrical cavities in a negative photoresist microstructures that have aspect ratios of 8:1.

Inventors:
Issue Date:
Research Org.:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174305
Patent Number(s):
6,558,868
Application Number:
09/785,053
Assignee:
Brookhaven Science Associates, LLC (Upton, NY) BNL
DOE Contract Number:  
AC02-98CH10886
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Warren, John B. Method of fabricating a high aspect ratio microstructure. United States: N. p., 2003. Web.
Warren, John B. Method of fabricating a high aspect ratio microstructure. United States.
Warren, John B. Tue . "Method of fabricating a high aspect ratio microstructure". United States. https://www.osti.gov/servlets/purl/1174305.
@article{osti_1174305,
title = {Method of fabricating a high aspect ratio microstructure},
author = {Warren, John B.},
abstractNote = {The present invention is for a method of fabricating a high aspect ratio, freestanding microstructure. The fabrication method modifies the exposure process for SU-8, an negative-acting, ultraviolet-sensitive photoresist used for microfabrication whereby a UV-absorbent glass substrate, chosen for complete absorption of UV radiation at 380 nanometers or less, is coated with a negative photoresist, exposed and developed according to standard practice. This UV absorbent glass enables the fabrication of cylindrical cavities in a negative photoresist microstructures that have aspect ratios of 8:1.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {5}
}

Patent:

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