Method of fabricating a high aspect ratio microstructure

Title: Method of fabricating a high aspect ratio microstructure

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Abstract

The present invention is for a method of fabricating a high aspect ratio, freestanding microstructure. The fabrication method modifies the exposure process for SU-8, an negative-acting, ultraviolet-sensitive photoresist used for microfabrication whereby a UV-absorbent glass substrate, chosen for complete absorption of UV radiation at 380 nanometers or less, is coated with a negative photoresist, exposed and developed according to standard practice. This UV absorbent glass enables the fabrication of cylindrical cavities in a negative photoresist microstructures that have aspect ratios of 8:1.

Inventors:: Warren, John B.

Issue Date:: 2003-05-06

Research Org.:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1174305

Patent Number(s):: 6,558,868

Application Number:: 09/785,053

Assignee:: Brookhaven Science Associates, LLC (Upton, NY) BNL

DOE Contract Number:: AC02-98CH10886

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE

Citation Formats


                    Warren, John B. Method of fabricating a high aspect ratio microstructure.  United States: N. p., 2003. 
        Web.

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                    Warren, John B. Method of fabricating a high aspect ratio microstructure.  United States.

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                    Warren, John B. Tue .  
        "Method of fabricating a high aspect ratio microstructure".  United States.  https://www.osti.gov/servlets/purl/1174305.

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@article{osti_1174305,

  title        = {Method of fabricating a high aspect ratio microstructure},

  author       = {Warren, John B.},

  abstractNote = {The present invention is for a method of fabricating a high aspect ratio, freestanding microstructure. The fabrication method modifies the exposure process for SU-8, an negative-acting, ultraviolet-sensitive photoresist used for microfabrication whereby a UV-absorbent glass substrate, chosen for complete absorption of UV radiation at 380 nanometers or less, is coated with a negative photoresist, exposed and developed according to standard practice. This UV absorbent glass enables the fabrication of cylindrical cavities in a negative photoresist microstructures that have aspect ratios of 8:1.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2003},

  month        = {5}

}

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