skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Membrane projection lithography

Abstract

The various technologies presented herein relate to a three dimensional manufacturing technique for application with semiconductor technologies. A membrane layer can be formed over a cavity. An opening can be formed in the membrane such that the membrane can act as a mask layer to the underlying wall surfaces and bottom surface of the cavity. A beam to facilitate an operation comprising any of implantation, etching or deposition can be directed through the opening onto the underlying surface, with the opening acting as a mask to control the area of the underlying surfaces on which any of implantation occurs, material is removed, and/or material is deposited. The membrane can be removed, a new membrane placed over the cavity and a new opening formed to facilitate another implantation, etching, or deposition operation. By changing the direction of the beam different wall/bottom surfaces can be utilized to form a plurality of structures.

Inventors:
; ; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1172748
Patent Number(s):
8981337
Application Number:
14/017,132
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Sep 03
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Burckel, David Bruce, Davids, Paul S, Resnick, Paul J, and Draper, Bruce L. Membrane projection lithography. United States: N. p., 2015. Web.
Burckel, David Bruce, Davids, Paul S, Resnick, Paul J, & Draper, Bruce L. Membrane projection lithography. United States.
Burckel, David Bruce, Davids, Paul S, Resnick, Paul J, and Draper, Bruce L. Tue . "Membrane projection lithography". United States. https://www.osti.gov/servlets/purl/1172748.
@article{osti_1172748,
title = {Membrane projection lithography},
author = {Burckel, David Bruce and Davids, Paul S and Resnick, Paul J and Draper, Bruce L},
abstractNote = {The various technologies presented herein relate to a three dimensional manufacturing technique for application with semiconductor technologies. A membrane layer can be formed over a cavity. An opening can be formed in the membrane such that the membrane can act as a mask layer to the underlying wall surfaces and bottom surface of the cavity. A beam to facilitate an operation comprising any of implantation, etching or deposition can be directed through the opening onto the underlying surface, with the opening acting as a mask to control the area of the underlying surfaces on which any of implantation occurs, material is removed, and/or material is deposited. The membrane can be removed, a new membrane placed over the cavity and a new opening formed to facilitate another implantation, etching, or deposition operation. By changing the direction of the beam different wall/bottom surfaces can be utilized to form a plurality of structures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2015},
month = {3}
}

Patent:

Save / Share:

Works referenced in this record:

Monolithic 3D-ICs with single grain Si thin film transistors
journal, May 2012


Three-dimensional IC trends
journal, January 1986


Wafer-level three-dimensional integrated circuits (3D IC): Schemes and key technologies
journal, November 2011


High-Throughput Nanofabrication of Infrared Plasmonic Nanoantenna Arrays for Vibrational Nanospectroscopy
journal, July 2010


Mapping the Plasmon Resonances of Metallic Nanoantennas
journal, February 2008


Fabrication of 3D Metamaterial Resonators Using Self-Aligned Membrane Projection Lithography
journal, June 2010


Micrometer-Scale Cubic Unit Cell 3D Metamaterial Layers
journal, October 2010


Dynamic membrane projection lithography [Invited]
journal, January 2011


Fabrication of ultrathin magnetic structures by nanostencil lithography in dynamic mode
journal, February 2007


A simultaneous vertical and horizontal self-patterning method for deep three-dimensional microstructures
journal, June 2007


All-photoplastic microstencil with self-alignment for multiple layer shadow-mask patterning
journal, October 2003


Photodetection with Active Optical Antennas
journal, May 2011


Fabrication of Hollow Metal “Nanocaps” and Their Red-Shifted Optical Absorption Spectra
journal, May 2005


Light-Bending Nanoparticles
journal, March 2009


Fabrication of metallic patterns by microstencil lithography on polymer surfaces suitable as microelectrodes in integrated microfluidic systems
journal, July 2006