Global to push GA events into
skip to main content

Title: Membrane projection lithography

The various technologies presented herein relate to a three dimensional manufacturing technique for application with semiconductor technologies. A membrane layer can be formed over a cavity. An opening can be formed in the membrane such that the membrane can act as a mask layer to the underlying wall surfaces and bottom surface of the cavity. A beam to facilitate an operation comprising any of implantation, etching or deposition can be directed through the opening onto the underlying surface, with the opening acting as a mask to control the area of the underlying surfaces on which any of implantation occurs, material is removed, and/or material is deposited. The membrane can be removed, a new membrane placed over the cavity and a new opening formed to facilitate another implantation, etching, or deposition operation. By changing the direction of the beam different wall/bottom surfaces can be utilized to form a plurality of structures.
Inventors:
; ; ;
Issue Date:
OSTI Identifier:
1172748
Assignee:
Sandia Corporation (Albuquerque, NM) SSO
Patent Number(s):
8,981,337
Application Number:
14/017,132
Contract Number:
AC04-94AL85000
Resource Relation:
Patent File Date: 2013 Sep 03
Research Org:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Other works cited in this record:

Monolithic 3D-ICs with single grain Si thin film transistors
journal, May 2012
  • Ishihara, R.; Derakhshandeh, J.; Tajari Mofrad, M. R.
  • Solid-State Electronics, Vol. 71, p. 80-87
  • DOI: 10.1016/j.sse.2011.10.025

Wafer-level three-dimensional integrated circuits (3D IC): Schemes and key technologies
journal, November 2011
  • Lai, Ming-Fang; Li, Shih-Wei; Shih, Jian-Yu
  • Microelectronic Engineering, Vol. 88, Issue 11, p. 3282-3286
  • DOI: 10.1016/j.mee.2011.05.036

Fabrication of 3D Metamaterial Resonators Using Self-Aligned Membrane Projection Lithography
journal, June 2010
  • Burckel, D. Bruce; Wendt, Joel R.; Ten Eyck, Gregory A.
  • Advanced Materials, Vol. 22, Issue 29, p. 3171-3175
  • DOI: 10.1002/adma.200904153

Micrometer-Scale Cubic Unit Cell 3D Metamaterial Layers
journal, October 2010
  • Burckel, D. Bruce; Wendt, Joel R.; Ten Eyck, Gregory A.
  • Advanced Materials, Vol. 22, Issue 44, p. 5053-5057
  • DOI: 10.1002/adma.201002429

All-photoplastic microstencil with self-alignment for multiple layer shadow-mask patterning
journal, October 2003
  • Kim, Gyuman; Kim, Beomjoon; Brugger, Jürgen
  • Sensors and Actuators A: Physical, Vol. 107, Issue 2, p. 132-136
  • DOI: 10.1016/S0924-4247(03)00298-X

Photodetection with Active Optical Antennas
journal, May 2011
  • Knight, M. W.; Sobhani, H.; Nordlander, P.
  • Science, Vol. 332, Issue 6030, p. 702-704
  • DOI: 10.1126/science.1203056

Fabrication of Hollow Metal “Nanocaps” and Their Red-Shifted Optical Absorption Spectra
journal, May 2005
  • Liu, J.; Maaroof, A. I.; Wieczorek, L.
  • Advanced Materials, Vol. 17, Issue 10, p. 1276-1281
  • DOI: 10.1002/adma.200500035

Similar records in DOepatents and OSTI.GOV collections: