Lattice matched crystalline substrates for cubic nitride semiconductor growth
Abstract
Disclosed embodiments include methods of fabricating a semiconductor layer or device and devices fabricated thereby. The methods include, but are not limited to, providing a substrate having a cubic crystalline surface with a known lattice parameter and growing a cubic crystalline group III-nitride alloy layer on the cubic crystalline substrate by coincident site lattice matched epitaxy. The cubic crystalline group III-nitride alloy may be prepared to have a lattice parameter (a') that is related to the lattice parameter of the substrate (a). The group III-nitride alloy may be a cubic crystalline In.sub.xGa.sub.yAl.sub.1-x-yN alloy. The lattice parameter of the In.sub.xGa.sub.yAl.sub.1-x-yN or other group III-nitride alloy may be related to the substrate lattice parameter by (a')= 2(a) or (a')=(a)/ 2. The semiconductor alloy may be prepared to have a selected band gap.
- Inventors:
- Issue Date:
- Research Org.:
- National Renewable Energy Laboratory (NREL), Golden, CO (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1171096
- Patent Number(s):
- 8961687
- Application Number:
- 12/551,430
- Assignee:
- Alliance for Sustainable Energy, LLC (Golden, CO)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC36-08GO28308
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2009 Aug 31
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Norman, Andrew G, Ptak, Aaron J, and McMahon, William E. Lattice matched crystalline substrates for cubic nitride semiconductor growth. United States: N. p., 2015.
Web.
Norman, Andrew G, Ptak, Aaron J, & McMahon, William E. Lattice matched crystalline substrates for cubic nitride semiconductor growth. United States.
Norman, Andrew G, Ptak, Aaron J, and McMahon, William E. Tue .
"Lattice matched crystalline substrates for cubic nitride semiconductor growth". United States. https://www.osti.gov/servlets/purl/1171096.
@article{osti_1171096,
title = {Lattice matched crystalline substrates for cubic nitride semiconductor growth},
author = {Norman, Andrew G and Ptak, Aaron J and McMahon, William E},
abstractNote = {Disclosed embodiments include methods of fabricating a semiconductor layer or device and devices fabricated thereby. The methods include, but are not limited to, providing a substrate having a cubic crystalline surface with a known lattice parameter and growing a cubic crystalline group III-nitride alloy layer on the cubic crystalline substrate by coincident site lattice matched epitaxy. The cubic crystalline group III-nitride alloy may be prepared to have a lattice parameter (a') that is related to the lattice parameter of the substrate (a). The group III-nitride alloy may be a cubic crystalline In.sub.xGa.sub.yAl.sub.1-x-yN alloy. The lattice parameter of the In.sub.xGa.sub.yAl.sub.1-x-yN or other group III-nitride alloy may be related to the substrate lattice parameter by (a')= 2(a) or (a')=(a)/ 2. The semiconductor alloy may be prepared to have a selected band gap.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 24 00:00:00 EST 2015},
month = {Tue Feb 24 00:00:00 EST 2015}
}
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Works referencing / citing this record:
Lattice matched crystalline substrates for cubic nitride semiconductor growth
patent, February 2015
- Norman, Andrew; Ptak, Aaron Joseph; McMahon, William Edwin
- US Patent Document 8,961,687
