Replication of patterned thin-film structures for use in plasmonics and metamaterials

Norris, David J; Han, Sang Eon; Bhan, Aditya; Nagpal, Prashant; Lindquist, Nathan Charles; Oh, Sang-Hyun

Title: Replication of patterned thin-film structures for use in plasmonics and metamaterials

Abstract

The present invention provides templating methods for replicating patterned metal films from a template substrate such as for use in plasmonic devices and metamaterials. Advantageously, the template substrate is reusable and can provide plural copies of the structure of the template substrate. Because high-quality substrates that are inherently smooth and flat are available, patterned metal films in accordance with the present invention can advantageously provide surfaces that replicate the surface characteristics of the template substrate both in the patterned regions and in the unpatterned regions.

Inventors:: Norris, David J; Han, Sang Eon; Bhan, Aditya; Nagpal, Prashant; Lindquist, Nathan Charles; Oh, Sang-Hyun

Issue Date:: 2015-02-03

Research Org.:: Univ. of Minnesota, Minneapolis, MN (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1169060

Patent Number(s):: 8948562

Application Number:: 13/131,197

Assignee:: Regents of the University of Minnesota (St. Paul, MN)

Patent Classifications (CPCs):: H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS

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H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L31/02327 - {the optical elements being integrated or being directly associated to the device, e.g. back reflectors

B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
B81C99/009 - {Manufacturing the stamps or the moulds}
B81C1/00119 - {Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems}

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B5/008 - {Surface plasmon devices
G02B1/002 - {made of materials engineered to provide properties not available in nature, e.g. metamaterials}

B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
B82Y40/00 - Manufacture or treatment of nanostructures

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
Y02E10/52 - PV systems with concentrators

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L49/006 - {Quantum devices, e.g. Quantum Interference Devices, Metal Single Electron Transistor

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/0002 - {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
Y10T428/12493 - Composite

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L31/054 - Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B6/1226 - {involving surface plasmon interaction}

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
Y10T428/12486 - Laterally noncoextensive components [e.g., embedded, etc.]
Y10T428/12507 - More than two components

B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
B82Y10/00 - Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L49/02 - Thin-film or thick-film devices

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DOE Contract Number:: FG02-06ER46438

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 70 PLASMA PHYSICS AND FUSION TECHNOLOGY

Citation Formats


                    Norris, David J, Han, Sang Eon, Bhan, Aditya, Nagpal, Prashant, Lindquist, Nathan Charles, and Oh, Sang-Hyun. Replication of patterned thin-film structures for use in plasmonics and metamaterials.  United States: N. p., 2015. 
        Web.

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                    Norris, David J, Han, Sang Eon, Bhan, Aditya, Nagpal, Prashant, Lindquist, Nathan Charles, & Oh, Sang-Hyun. Replication of patterned thin-film structures for use in plasmonics and metamaterials.  United States.

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                    Norris, David J, Han, Sang Eon, Bhan, Aditya, Nagpal, Prashant, Lindquist, Nathan Charles, and Oh, Sang-Hyun. Tue .  
        "Replication of patterned thin-film structures for use in plasmonics and metamaterials".  United States.  https://www.osti.gov/servlets/purl/1169060.

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@article{osti_1169060,

  title        = {Replication of patterned thin-film structures for use in plasmonics and metamaterials},

  author       = {Norris, David J and Han, Sang Eon and Bhan, Aditya and Nagpal, Prashant and Lindquist, Nathan Charles and Oh, Sang-Hyun},

  abstractNote = {The present invention provides templating methods for replicating patterned metal films from a template substrate such as for use in plasmonic devices and metamaterials. Advantageously, the template substrate is reusable and can provide plural copies of the structure of the template substrate. Because high-quality substrates that are inherently smooth and flat are available, patterned metal films in accordance with the present invention can advantageously provide surfaces that replicate the surface characteristics of the template substrate both in the patterned regions and in the unpatterned regions.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2015},

  month        = {2}

}

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Works referenced in this record:

Photoplastic near-field optical probe with sub-100 nm aperture made by replication from a nanomould: PHOTOPLASTIC NEAR-FIELD OPTICAL PROBE
journal, March 2003

Kim, G. M.; Kim, B. J.; Ten Have, E. S.
Journal of Microscopy, Vol. 209, Issue 3
https://doi.org/10.1046/j.1365-2818.2003.01134.x

Templated Fabrication of Periodic Metallic Nanopyramid Arrays
journal, September 2007

Sun, Chih-Hung; Linn, Nicholas C.; Jiang, Peng
Chemistry of Materials, Vol. 19, Issue 18
https://doi.org/10.1021/cm0712319

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Title: Replication of patterned thin-film structures for use in plasmonics and metamaterials

Abstract

Citation Formats

Photoplastic near-field optical probe with sub-100 nm aperture made by replication from a nanomould: PHOTOPLASTIC NEAR-FIELD OPTICAL PROBE journal, March 2003

Templated Fabrication of Periodic Metallic Nanopyramid Arrays journal, September 2007

Photoplastic near-field optical probe with sub-100 nm aperture made by replication from a nanomould: PHOTOPLASTIC NEAR-FIELD OPTICAL PROBE
journal, March 2003

Templated Fabrication of Periodic Metallic Nanopyramid Arrays
journal, September 2007