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Title: Thin film application device and method for coating small aperture vacuum vessels

Abstract

A device and method for coating an inside surface of a vessel is provided. In one embodiment, a coating device comprises a power supply and a diode in electrical communication with the power supply, wherein electrodes comprising the diode reside completely within the vessel. The method comprises reversibly sealing electrodes in a vessel, sputtering elemental metal or metal compound on the surface while maintaining the surface in a controlled atmosphere.

Inventors:
;
Issue Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1168692
Patent Number(s):
8940140
Application Number:
11/850,409
Assignee:
Uchicago Argonne, LLC (Chicago, IL)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION; 36 MATERIALS SCIENCE

Citation Formats

Walters, Dean R, and Este, Grantley O. Thin film application device and method for coating small aperture vacuum vessels. United States: N. p., 2015. Web.
Walters, Dean R, & Este, Grantley O. Thin film application device and method for coating small aperture vacuum vessels. United States.
Walters, Dean R, and Este, Grantley O. Tue . "Thin film application device and method for coating small aperture vacuum vessels". United States. https://www.osti.gov/servlets/purl/1168692.
@article{osti_1168692,
title = {Thin film application device and method for coating small aperture vacuum vessels},
author = {Walters, Dean R and Este, Grantley O},
abstractNote = {A device and method for coating an inside surface of a vessel is provided. In one embodiment, a coating device comprises a power supply and a diode in electrical communication with the power supply, wherein electrodes comprising the diode reside completely within the vessel. The method comprises reversibly sealing electrodes in a vessel, sputtering elemental metal or metal compound on the surface while maintaining the surface in a controlled atmosphere.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 27 00:00:00 EST 2015},
month = {Tue Jan 27 00:00:00 EST 2015}
}

Works referenced in this record:

Glow discharge method and apparatus
patent, January 1979


Vacuum arc deposition apparatus
patent, April 1998


Method and apparatus for magnetron sputtering
patent, August 2002