DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Nozzle geometry for organic vapor jet printing

Abstract

A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.

Inventors:
;
Issue Date:
Research Org.:
Univ. of Michigan, Ann Arbor, MI (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1167242
Patent Number(s):
8931431
Application Number:
12/729,448
Assignee:
The Regents of The University of Michigan (Ann Arbor, MI)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B41 - PRINTING B41J - TYPEWRITERS
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
FC26-04NT42273
Resource Type:
Patent
Resource Relation:
Patent File Date: 2010 Mar 23
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Forrest, Stephen R, and McGraw, Gregory. Nozzle geometry for organic vapor jet printing. United States: N. p., 2015. Web.
Forrest, Stephen R, & McGraw, Gregory. Nozzle geometry for organic vapor jet printing. United States.
Forrest, Stephen R, and McGraw, Gregory. Tue . "Nozzle geometry for organic vapor jet printing". United States. https://www.osti.gov/servlets/purl/1167242.
@article{osti_1167242,
title = {Nozzle geometry for organic vapor jet printing},
author = {Forrest, Stephen R and McGraw, Gregory},
abstractNote = {A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 13 00:00:00 EST 2015},
month = {Tue Jan 13 00:00:00 EST 2015}
}

Works referenced in this record:

Selective Printer Employing Inking Spark Discharge
patent, February 1972


Chemical Vapor Deposition of Coatings
patent, November 1974


Vapor deposition nozzle
patent, March 1976


Chemical vapor deposition of coatings
patent, April 1976


Ink jet nozzle structure
patent, May 1976


Ink jet nozzle method of manufacture
patent, August 1978


Method of manufacturing an ink jet head
patent, August 1987


Evaporation source with a shaped nozzle
patent, March 1989


Plasma reactor apparatus and method for treating a substrate
patent, July 1990


Semiconductor microactuator
patent, December 1991


Drop-on-demand ink jet print head
patent, February 1992


Valve and semiconductor fabricating equipment using the same
patent, January 1995


Fabrication of ink fill slots in thermal ink-jet printheads utilizing chemical micromachining
patent, February 1995


Apparatus for growing group II-VI mixed compound semiconductor
patent, July 1995


Ink jet nozzle/valve, pen and printer
patent, July 1997


Reactant gas ejector head and thin-film vapor deposition apparatus
patent, March 1998


Gas injection system for semiconductor processing
patent, December 1998


High density plasma CVD reactor with combined inductive and capacitive coupling
patent, February 1999


Reliable high performance drop generator for an inkjet printhead
patent, February 1999


Gas injection system for plasma processing
patent, January 2000


Chemical vapor deposition manifold
patent, February 2000


Coating apparatus for semiconductor process
patent, August 2000


Vapor-phase film growth apparatus and gas ejection head
patent, October 2000


Method for chemical vapor deposition of a material on a substrate
patent, October 2000


Ink jet head and method of manufacturing same
patent, August 2001


CMOS/MEMS integrated ink jet print head with silicon based lateral flow nozzle architecture and method of forming same
patent, August 2002


Film processing system
patent, December 2003


Suspended gas distribution manifold for plasma chamber
patent, August 2004


Method for fabricating microelectromechanical structures for liquid emission devices
patent, December 2004


Deposition of integrated circuit fabrication materials using a print head
patent, August 2006


Managing bubbles in a fluid-delivery device
patent, August 2006


Complexes with tridentate ligands
patent, October 2007


Delivery device comprising gas diffuser for thin film deposition
patent, September 2010


Gas injector and apparatus including the same
patent, December 2010


Apparatus for processing a substrate
patent, September 2011


High speed high resolution fluid ejection
patent, February 2012


Plasma processing apparatus
patent, March 2013


Compact organic vapor jet printing print head
patent, December 2013


Device and method for organic vapor jet deposition
patent-application, March 2004


Method and apparatus for depositing material
patent-application, April 2005


Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method
patent-application, November 2005


Member for plasma processing apparatus and plasma processing apparatus
patent-application, July 2006


Ballistic aerosol marking venturi pipe geometry for printing onto a transfuse substrate
patent-application, March 2007


Corona discharge plasma source devices, and various systems and methods of using same
patent-application, August 2007


Delivery Device Comprising Gas Diffuser for Thin Film Deposition
patent-application, July 2008


Three Dimensional Micro-Fabricated Burners
patent-application, June 2010


Compact Organic Vapor Jet Printing Print Head
patent-application, September 2010


Nozzle Geometry for Organic Vapor Jet Printing
patent-application, September 2010


Organic Vapor Jet Deposition Using an Exhaust
patent-application, April 2011


Gas Cushion Control of OVJP Print Head Position
patent-application, August 2013


The Flow of Highly Rarefied Gases through Tubes of Arbitrary Length
journal, September 1971


Molecular flow transmission probabilities of rectangular tubes
journal, July 1991


Strategies in deep wet etching of Pyrex glass
journal, February 2007


Field Assisted Glass Sealing
journal, January 1975


Anodic bonding
journal, October 2006