Method of fabricating low-dislocation-density epitaxially-grown films with textured surfaces
Abstract
A method for forming a surface-textured single-crystal film layer by growing the film atop a layer of microparticles on a substrate and subsequently selectively etching away the microparticles to release the surface-textured single-crystal film layer from the substrate. This method is applicable to a very wide variety of substrates and films. In some embodiments, the film is an epitaxial film that has been grown in crystallographic alignment with respect to a crystalline substrate.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1167224
- Patent Number(s):
- 8932403
- Application Number:
- 13/113,123
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2011 May 23
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Citation Formats
Li, Qiming, and Wang, George T. Method of fabricating low-dislocation-density epitaxially-grown films with textured surfaces. United States: N. p., 2015.
Web.
Li, Qiming, & Wang, George T. Method of fabricating low-dislocation-density epitaxially-grown films with textured surfaces. United States.
Li, Qiming, and Wang, George T. Tue .
"Method of fabricating low-dislocation-density epitaxially-grown films with textured surfaces". United States. https://www.osti.gov/servlets/purl/1167224.
@article{osti_1167224,
title = {Method of fabricating low-dislocation-density epitaxially-grown films with textured surfaces},
author = {Li, Qiming and Wang, George T},
abstractNote = {A method for forming a surface-textured single-crystal film layer by growing the film atop a layer of microparticles on a substrate and subsequently selectively etching away the microparticles to release the surface-textured single-crystal film layer from the substrate. This method is applicable to a very wide variety of substrates and films. In some embodiments, the film is an epitaxial film that has been grown in crystallographic alignment with respect to a crystalline substrate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2015},
month = {1}
}
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