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Title: Fast electron microscopy via compressive sensing

Abstract

Various technologies described herein pertain to compressive sensing electron microscopy. A compressive sensing electron microscope includes a multi-beam generator and a detector. The multi-beam generator emits a sequence of electron patterns over time. Each of the electron patterns can include a plurality of electron beams, where the plurality of electron beams is configured to impart a spatially varying electron density on a sample. Further, the spatially varying electron density varies between each of the electron patterns in the sequence. Moreover, the detector collects signals respectively corresponding to interactions between the sample and each of the electron patterns in the sequence.

Inventors:
; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1165123
Patent Number(s):
8,907,280
Application Number:
13/622,943
Assignee:
Sandia Corporation (Albuquerque, NM)
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Patent File Date: 2012 Sep 19
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Larson, Kurt W, Anderson, Hyrum S, and Wheeler, Jason W. Fast electron microscopy via compressive sensing. United States: N. p., 2014. Web.
Larson, Kurt W, Anderson, Hyrum S, & Wheeler, Jason W. Fast electron microscopy via compressive sensing. United States.
Larson, Kurt W, Anderson, Hyrum S, and Wheeler, Jason W. Tue . "Fast electron microscopy via compressive sensing". United States. https://www.osti.gov/servlets/purl/1165123.
@article{osti_1165123,
title = {Fast electron microscopy via compressive sensing},
author = {Larson, Kurt W and Anderson, Hyrum S and Wheeler, Jason W},
abstractNote = {Various technologies described herein pertain to compressive sensing electron microscopy. A compressive sensing electron microscope includes a multi-beam generator and a detector. The multi-beam generator emits a sequence of electron patterns over time. Each of the electron patterns can include a plurality of electron beams, where the plurality of electron beams is configured to impart a spatially varying electron density on a sample. Further, the spatially varying electron density varies between each of the electron patterns in the sequence. Moreover, the detector collects signals respectively corresponding to interactions between the sample and each of the electron patterns in the sequence.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {12}
}

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Works referenced in this record:

Compressed sensing
journal, April 2006


Computational Methods for Sparse Solution of Linear Inverse Problems
journal, June 2010


eMET: 50 keV electron mask exposure tool development based on proven multi-beam projection technology
conference, September 2010

  • Platzgummer, Elmar; Cernusca, Stefan; Klein, Christof
  • SPIE Photomask Technology, SPIE Proceedings
  • DOI: 10.1117/12.864261

Practical compressive sensing with Toeplitz and circulant matrices
conference, July 2010

  • Yin, Wotao; Morgan, Simon; Yang, Junfeng
  • Visual Communications and Image Processing 2010, SPIE Proceedings
  • DOI: 10.1117/12.863527

Addressable field emitter array: A tool for designing field emitters and a multibeam electron source
journal, January 2004

  • Bauerdick, S.; Burkhardt, C.; Kern, D. P.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 6
  • DOI: 10.1116/1.1824050

An electromagnetically focused electron beam line source
journal, November 2003

  • Iqbal, Munawar; Masood, Khalid; Rafiq, Mohammad
  • Review of Scientific Instruments, Vol. 74, Issue 11
  • DOI: 10.1063/1.1614852

Distributed axis electron beam technology for maskless lithography and defect inspection
journal, January 2003

  • Pickard, D. S.; Groves, T. R.; Meisburger, W. D.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6
  • DOI: 10.1116/1.1629291

Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning
journal, March 2011

  • Eder Kapl, Stefan; Loeschner, Hans; Piller, Walter
  • Journal of Micromechanics and Microengineering, Vol. 21, Issue 4
  • DOI: 10.1088/0960-1317/21/4/045038

Distributed, multiple variable shaped electron beam column for high throughput maskless lithography
journal, November 1998

  • Groves, T. R.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6
  • DOI: 10.1116/1.590458

eMET POC: realization of a proof-of-concept 50 keV electron multibeam mask exposure tool
conference, October 2011

  • Platzgummer, Elmar; Klein, Christof; Loeschner, Hans
  • SPIE Photomask Technology, SPIE Proceedings
  • DOI: 10.1117/12.895523

Secondary electron detection for distributed axis electron beam systems
journal, August 2008

  • Tanimoto, S.; Pickard, D. S.; Kenney, C.
  • Microelectronic Engineering, Vol. 85, Issue 8, p. 1786-1791
  • DOI: 10.1016/j.mee.2008.05.021

High-Speed Scanning Electron Microscopy using Distributed-axis Electron Optics
conference, November 2007

  • Pease, R. Fabian; Pickard, Daniel S.; Tanimoto, Sayaka
  • 2007 Digest of papers Microprocesses and Nanotechnology
  • DOI: 10.1109/IMNC.2007.4456280