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Title: Fast electron microscopy via compressive sensing

Abstract

Various technologies described herein pertain to compressive sensing electron microscopy. A compressive sensing electron microscope includes a multi-beam generator and a detector. The multi-beam generator emits a sequence of electron patterns over time. Each of the electron patterns can include a plurality of electron beams, where the plurality of electron beams is configured to impart a spatially varying electron density on a sample. Further, the spatially varying electron density varies between each of the electron patterns in the sequence. Moreover, the detector collects signals respectively corresponding to interactions between the sample and each of the electron patterns in the sequence.

Inventors:
; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1165123
Patent Number(s):
8907280
Application Number:
13/622,943
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Patent File Date: 2012 Sep 19
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Larson, Kurt W, Anderson, Hyrum S, and Wheeler, Jason W. Fast electron microscopy via compressive sensing. United States: N. p., 2014. Web.
Larson, Kurt W, Anderson, Hyrum S, & Wheeler, Jason W. Fast electron microscopy via compressive sensing. United States.
Larson, Kurt W, Anderson, Hyrum S, and Wheeler, Jason W. Tue . "Fast electron microscopy via compressive sensing". United States. https://www.osti.gov/servlets/purl/1165123.
@article{osti_1165123,
title = {Fast electron microscopy via compressive sensing},
author = {Larson, Kurt W and Anderson, Hyrum S and Wheeler, Jason W},
abstractNote = {Various technologies described herein pertain to compressive sensing electron microscopy. A compressive sensing electron microscope includes a multi-beam generator and a detector. The multi-beam generator emits a sequence of electron patterns over time. Each of the electron patterns can include a plurality of electron beams, where the plurality of electron beams is configured to impart a spatially varying electron density on a sample. Further, the spatially varying electron density varies between each of the electron patterns in the sequence. Moreover, the detector collects signals respectively corresponding to interactions between the sample and each of the electron patterns in the sequence.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {12}
}

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Works referenced in this record:

Compressed sensing
journal, April 2006


Computational Methods for Sparse Solution of Linear Inverse Problems
journal, June 2010


eMET: 50 keV electron mask exposure tool development based on proven multi-beam projection technology
conference, September 2010


Practical compressive sensing with Toeplitz and circulant matrices
conference, July 2010


Addressable field emitter array: A tool for designing field emitters and a multibeam electron source
journal, January 2004

  • Bauerdick, S.; Burkhardt, C.; Kern, D. P.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 6
  • https://doi.org/10.1116/1.1824050

An electromagnetically focused electron beam line source
journal, November 2003


Distributed axis electron beam technology for maskless lithography and defect inspection
journal, January 2003

  • Pickard, D. S.; Groves, T. R.; Meisburger, W. D.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6
  • https://doi.org/10.1116/1.1629291

Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning
journal, March 2011


Distributed, multiple variable shaped electron beam column for high throughput maskless lithography
journal, November 1998


eMET POC: realization of a proof-of-concept 50 keV electron multibeam mask exposure tool
conference, October 2011


Secondary electron detection for distributed axis electron beam systems
journal, August 2008


High-Speed Scanning Electron Microscopy using Distributed-axis Electron Optics
conference, November 2007