Method to create gradient index in a polymer
Abstract
Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of .DELTA.n.gtoreq.1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1159969
- Patent Number(s):
- 8859190
- Application Number:
- 14/018,058
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2013 Sep 04
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Dirk, Shawn M, Johnson, Ross Stefan, Boye, Robert, Descour, Michael R, Sweatt, William C, Wheeler, David R, and Kaehr, Bryan James. Method to create gradient index in a polymer. United States: N. p., 2014.
Web.
Dirk, Shawn M, Johnson, Ross Stefan, Boye, Robert, Descour, Michael R, Sweatt, William C, Wheeler, David R, & Kaehr, Bryan James. Method to create gradient index in a polymer. United States.
Dirk, Shawn M, Johnson, Ross Stefan, Boye, Robert, Descour, Michael R, Sweatt, William C, Wheeler, David R, and Kaehr, Bryan James. Tue .
"Method to create gradient index in a polymer". United States. https://www.osti.gov/servlets/purl/1159969.
@article{osti_1159969,
title = {Method to create gradient index in a polymer},
author = {Dirk, Shawn M and Johnson, Ross Stefan and Boye, Robert and Descour, Michael R and Sweatt, William C and Wheeler, David R and Kaehr, Bryan James},
abstractNote = {Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of .DELTA.n.gtoreq.1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {10}
}
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Works referenced in this record:
Deformation-based contact lithography systems, apparatus and methods
patent-application, April 2008
- Stewart, Duncan R.; Walmsley, Robert; Hartwell, Peter G.
- US Patent Application 11/548975; 20080090155
Thermal writing using a heated atomic force microscope tip
journal, July 1996
- Mamin, H. J.
- Applied Physics Letters, Vol. 69, Issue 3
Photopatterning poly(p-phenylenevinylene) from xanthate precursor polymers
journal, January 2011
- Johnson, Ross S.; Finnegan, Patrick S.; Wheeler, David R.
- Chemical Communications, Vol. 47, Issue 13
Study of thermal conversion and patterning of a new soluble poly (p-phenylenevinylene) (PPV) precursor
journal, April 2007
- Prelipceanu, Marius; Prelipceanu, Otilia-Sanda; Tudose, Ovidiu-Gelu
- Materials Science in Semiconductor Processing, Vol. 10, Issue 2-3, p. 77-89