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Title: Dynamic tuning of chemiresistor sensitivity using mechanical strain

Abstract

The sensitivity of a chemiresistor sensor can be dynamically tuned using mechanical strain. The increase in sensitivity is a smooth, continuous function of the applied strain, and the effect can be reversible. Sensitivity tuning enables the response curve of the sensor to be dynamically optimized for sensing analytes, such as volatile organic compounds, over a wide concentration range.

Inventors:
;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1159929
Patent Number(s):
8,846,406
Application Number:
13/353,941
Assignee:
Sandia Corporation (Albuquerque, NM)
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Martin, James E, and Read, Douglas H. Dynamic tuning of chemiresistor sensitivity using mechanical strain. United States: N. p., 2014. Web.
Martin, James E, & Read, Douglas H. Dynamic tuning of chemiresistor sensitivity using mechanical strain. United States.
Martin, James E, and Read, Douglas H. Tue . "Dynamic tuning of chemiresistor sensitivity using mechanical strain". United States. https://www.osti.gov/servlets/purl/1159929.
@article{osti_1159929,
title = {Dynamic tuning of chemiresistor sensitivity using mechanical strain},
author = {Martin, James E and Read, Douglas H},
abstractNote = {The sensitivity of a chemiresistor sensor can be dynamically tuned using mechanical strain. The increase in sensitivity is a smooth, continuous function of the applied strain, and the effect can be reversible. Sensitivity tuning enables the response curve of the sensor to be dynamically optimized for sensing analytes, such as volatile organic compounds, over a wide concentration range.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {9}
}

Patent:

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