Method of lift-off patterning thin films in situ employing phase change resists

Bahlke, Matthias Erhard; Baldo, Marc A; Mendoza, Hiroshi Antonio

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Title: Method of lift-off patterning thin films in situ employing phase change resists

Abstract

Method for making a patterned thin film of an organic semiconductor. The method includes condensing a resist gas into a solid film onto a substrate cooled to a temperature below the condensation point of the resist gas. The condensed solid film is heated selectively with a patterned stamp to cause local direct sublimation from solid to vapor of selected portions of the solid film thereby creating a patterned resist film. An organic semiconductor film is coated on the patterned resist film and the patterned resist film is heated to cause it to sublime away and to lift off because of the phase change.

Inventors:: Bahlke, Matthias Erhard; Baldo, Marc A; Mendoza, Hiroshi Antonio

Issue Date:: Tue Sep 23 00:00:00 EDT 2014

Research Org.:: Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1159897

Patent Number(s):: 8841152

Application Number:: 13/465,065

Assignee:: Massachusetts Institute of Technology (Cambridge, MA)

DOE Contract Number:: SC00G1088

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE

Citation Formats


                    Bahlke, Matthias Erhard, Baldo, Marc A, and Mendoza, Hiroshi Antonio. Method of lift-off patterning thin films in situ employing phase change resists.  United States: N. p., 2014. 
        Web.

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                    Bahlke, Matthias Erhard, Baldo, Marc A, & Mendoza, Hiroshi Antonio. Method of lift-off patterning thin films in situ employing phase change resists.  United States.

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                    Bahlke, Matthias Erhard, Baldo, Marc A, and Mendoza, Hiroshi Antonio. Tue .  
        "Method of lift-off patterning thin films in situ employing phase change resists".  United States.  https://www.osti.gov/servlets/purl/1159897.

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@article{osti_1159897,

  title        = {Method of lift-off patterning thin films in situ employing phase change resists},

  author       = {Bahlke, Matthias Erhard and Baldo, Marc A and Mendoza, Hiroshi Antonio},

  abstractNote = {Method for making a patterned thin film of an organic semiconductor. The method includes condensing a resist gas into a solid film onto a substrate cooled to a temperature below the condensation point of the resist gas. The condensed solid film is heated selectively with a patterned stamp to cause local direct sublimation from solid to vapor of selected portions of the solid film thereby creating a patterned resist film. An organic semiconductor film is coated on the patterned resist film and the patterned resist film is heated to cause it to sublime away and to lift off because of the phase change.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Tue Sep 23 00:00:00 EDT 2014},

  month        = {Tue Sep 23 00:00:00 EDT 2014}

}

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