Method of lift-off patterning thin films in situ employing phase change resists
Abstract
Method for making a patterned thin film of an organic semiconductor. The method includes condensing a resist gas into a solid film onto a substrate cooled to a temperature below the condensation point of the resist gas. The condensed solid film is heated selectively with a patterned stamp to cause local direct sublimation from solid to vapor of selected portions of the solid film thereby creating a patterned resist film. An organic semiconductor film is coated on the patterned resist film and the patterned resist film is heated to cause it to sublime away and to lift off because of the phase change.
- Inventors:
- Issue Date:
- Research Org.:
- Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1159897
- Patent Number(s):
- 8841152
- Application Number:
- 13/465,065
- Assignee:
- Massachusetts Institute of Technology (Cambridge, MA)
- DOE Contract Number:
- SC00G1088
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Bahlke, Matthias Erhard, Baldo, Marc A, and Mendoza, Hiroshi Antonio. Method of lift-off patterning thin films in situ employing phase change resists. United States: N. p., 2014.
Web.
Bahlke, Matthias Erhard, Baldo, Marc A, & Mendoza, Hiroshi Antonio. Method of lift-off patterning thin films in situ employing phase change resists. United States.
Bahlke, Matthias Erhard, Baldo, Marc A, and Mendoza, Hiroshi Antonio. Tue .
"Method of lift-off patterning thin films in situ employing phase change resists". United States. https://www.osti.gov/servlets/purl/1159897.
@article{osti_1159897,
title = {Method of lift-off patterning thin films in situ employing phase change resists},
author = {Bahlke, Matthias Erhard and Baldo, Marc A and Mendoza, Hiroshi Antonio},
abstractNote = {Method for making a patterned thin film of an organic semiconductor. The method includes condensing a resist gas into a solid film onto a substrate cooled to a temperature below the condensation point of the resist gas. The condensed solid film is heated selectively with a patterned stamp to cause local direct sublimation from solid to vapor of selected portions of the solid film thereby creating a patterned resist film. An organic semiconductor film is coated on the patterned resist film and the patterned resist film is heated to cause it to sublime away and to lift off because of the phase change.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {9}
}
Works referenced in this record:
Dry process for the production of microelectronic devices
patent, September 1982
- Okumura, Koji; Saeva, Franklin D.
- US Patent Document 4,348,473
Process for fabricating cryogenic targets and targets made thereby
patent, August 1985
- Whitlock, Robert R.
- US Patent Document 4,535,023
Melt-based patterning for electronic devices
patent, October 2007
- Karg, Siegfried F.; Riel, Heike E.; Riess, Walter
- US Patent Document 7,282,430
Lift-off positive resist composition
patent, January 2008
- Kawana, Daisuke; Yamada, Tomotaka; Shimbori, Hiroshi
- US Patent Document 7,318,992
Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
patent, October 2008
- Golovchenko, Jene A.; King, Gavin M.; Schurmann, Gregor M.
- US Patent Document 7,435,353
Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers
patent, April 2009
- Branton, Daniel; Golovchenko, Jene A.; King, Gavin M.
- US Patent Document 7,524,431
Field effect transistor having a structure in which an organic semiconductor that forms a channel is made of a single crystal or a polycrystal of organic molecules
patent, October 2009
- Fujimori, Masaaki; Hashizume, Tomihiro; Ando, Masahiko
- US Patent Document 7,608,857
Method for manufacturing a patterned structure
patent, July 2010
- Asscher, Micha; Kerner, Gabriel
- US Patent Document 7,759,609
Exposure apparatus and laser working method
patent-application, September 2001
- Koide, Jun
- US Patent Application 09/771885; 20010023052
Electroluminescent materials and methods of manufacture and use
patent-application, December 2003
- Li, Yingbo; Baetzold, John P.; Spawn, Terence D.
- US Patent Application 10/285114; 20030224205
Melt-based patterning for electronic devices
patent-application, January 2005
- Karg, Siegfried F.; Riel, Heike E.; Riess, Walter H.
- US Patent Application 10/852714; 20050009231
Organic light emitting device
patent-application, April 2006
- Lee, Su-Mi; Park, Joon-Young
- US Patent Application 11/228264; 20060083946
Frequency Doubling using a Photo-Resist Template Mask
patent-application, April 2009
- Bencher, Christopher Dennis; Dai, Huixiong; Miao, Li Yan
- US Patent Application 12/257953; 20090111281
Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
patent-application, July 2009
- Branton, Daniel; Golovchenko, JeneA.; King, Gavin M.
- US Patent Application 12/381502; 20090173716
Method and Apparatus for Light Absorption and Charged Carrier Transport
patent-application, July 2010
- Xue, Jianggeng
- US Patent Application 12/601371; 20100170563
Method of Fabricating Organic Light Emitting Diode Display
patent-application, May 2011
- Yee, Moonky; Han, Changwook; Kim, Woochan
- US Patent Application 12/907689; 20110111542
Method of Forming Organic Thin Film Pattern and Method of Manufacturing Organic Light-Emitting Display Device by Using the Method of FOrming Organic Thin FIlm Pattern
patent-application, July 2001
- Lee, Kang-Il; Choi, Yong-Sup; Roh, Chool-Lae
- US Patent Application 12/963928; 20110171763
Works referencing / citing this record:
Method of lift-off patterning thin films in situ employing phase change resists
patent, September 2014
- Bahlke, Matthias; Baldo, Marc A.; Mendoza, Hiroshi Antonio
- US Patent Document 8,841,152