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Title: Ion beam sputter target and method of manufacture

Abstract

A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.

Inventors:
; ; ; ; ; ;
Issue Date:
Research Org.:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1156819
Patent Number(s):
8821701
Application Number:
12/792,324
Assignee:
GFO
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
FG36-06GO1605
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY

Citation Formats

Higdon, Clifton, Elmoursi, Alaa A., Goldsmith, Jason, Cook, Bruce, Blau, Peter, Jun, Qu, and Milner, Robert. Ion beam sputter target and method of manufacture. United States: N. p., 2014. Web.
Higdon, Clifton, Elmoursi, Alaa A., Goldsmith, Jason, Cook, Bruce, Blau, Peter, Jun, Qu, & Milner, Robert. Ion beam sputter target and method of manufacture. United States.
Higdon, Clifton, Elmoursi, Alaa A., Goldsmith, Jason, Cook, Bruce, Blau, Peter, Jun, Qu, and Milner, Robert. Tue . "Ion beam sputter target and method of manufacture". United States. https://www.osti.gov/servlets/purl/1156819.
@article{osti_1156819,
title = {Ion beam sputter target and method of manufacture},
author = {Higdon, Clifton and Elmoursi, Alaa A. and Goldsmith, Jason and Cook, Bruce and Blau, Peter and Jun, Qu and Milner, Robert},
abstractNote = {A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {9}
}

Works referenced in this record:

Target for sputtering
patent, September 1986


Target source for ion beam sputter deposition
patent, April 1990


Facing targets sputtering device
patent, March 1991


Sputtering target
patent, March 1993


Method and device for sputtering of films
patent, August 1993


Wear resistant coating films and their coated articles
patent, June 1994


Mosaic target
patent, November 1995


Plasma enhancement apparatus and method for physical vapor deposition
patent, October 2000


Method and device for PVD coating
patent, March 2002


Method and apparatus for thin film deposition using an active shutter
patent, September 2002


Process for producing thin metal oxide film
patent, September 2004


Sputter target and method of using a sputter target
patent, February 2005


Process for producing a hard-material-coated component
patent, March 2005


Mixed germanium-silicon thermal control blanket
patent, September 2007


Staggered target tiles
patent, June 2009


Friction- and wear-reducing coating
patent, October 2011


Target tiles in a staggered array
patent-application, January 2006