Environmentally-assisted technique for transferring devices onto non-conventional substrates
Abstract
A device fabrication method includes: (1) providing a growth substrate including a base and an oxide layer disposed over the base; (2) forming a metal layer over the oxide layer; (3) forming a stack of device layers over the metal layer; (4) performing interfacial debonding of the metal layer to separate the stack of device layers and the metal layer from the growth substrate; and (5) affixing the stack of device layers to a target substrate.
- Inventors:
- Issue Date:
- Research Org.:
- Leland Stanford Junior University, Palo Alto, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1151764
- Patent Number(s):
- 8815707
- Application Number:
- 13/791,214
- Assignee:
- Board of Trustees of the Leland Stanford Junior University (Palo Alto, CA)
- Patent Classifications (CPCs):
-
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- SC0001060
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Lee, Chi-Hwan, Kim, Dong Rip, and Zheng, Xiaolin. Environmentally-assisted technique for transferring devices onto non-conventional substrates. United States: N. p., 2014.
Web.
Lee, Chi-Hwan, Kim, Dong Rip, & Zheng, Xiaolin. Environmentally-assisted technique for transferring devices onto non-conventional substrates. United States.
Lee, Chi-Hwan, Kim, Dong Rip, and Zheng, Xiaolin. Tue .
"Environmentally-assisted technique for transferring devices onto non-conventional substrates". United States. https://www.osti.gov/servlets/purl/1151764.
@article{osti_1151764,
title = {Environmentally-assisted technique for transferring devices onto non-conventional substrates},
author = {Lee, Chi-Hwan and Kim, Dong Rip and Zheng, Xiaolin},
abstractNote = {A device fabrication method includes: (1) providing a growth substrate including a base and an oxide layer disposed over the base; (2) forming a metal layer over the oxide layer; (3) forming a stack of device layers over the metal layer; (4) performing interfacial debonding of the metal layer to separate the stack of device layers and the metal layer from the growth substrate; and (5) affixing the stack of device layers to a target substrate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {8}
}
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