DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Optical cavity furnace for semiconductor wafer processing

Abstract

An optical cavity furnace 10 having multiple optical energy sources 12 associated with an optical cavity 18 of the furnace. The multiple optical energy sources 12 may be lamps or other devices suitable for producing an appropriate level of optical energy. The optical cavity furnace 10 may also include one or more reflectors 14 and one or more walls 16 associated with the optical energy sources 12 such that the reflectors 14 and walls 16 define the optical cavity 18. The walls 16 may have any desired configuration or shape to enhance operation of the furnace as an optical cavity 18. The optical energy sources 12 may be positioned at any location with respect to the reflectors 14 and walls defining the optical cavity. The optical cavity furnace 10 may further include a semiconductor wafer transport system 22 for transporting one or more semiconductor wafers 20 through the optical cavity.

Inventors:
Issue Date:
Research Org.:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1150004
Patent Number(s):
8796160
Application Number:
12/919,433
Assignee:
Alliance for Sustainable Energy, LLC (Golden, CO)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05B - ELECTRIC HEATING
DOE Contract Number:  
AC36-08G028308
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Sopori, Bhushan L. Optical cavity furnace for semiconductor wafer processing. United States: N. p., 2014. Web.
Sopori, Bhushan L. Optical cavity furnace for semiconductor wafer processing. United States.
Sopori, Bhushan L. Tue . "Optical cavity furnace for semiconductor wafer processing". United States. https://www.osti.gov/servlets/purl/1150004.
@article{osti_1150004,
title = {Optical cavity furnace for semiconductor wafer processing},
author = {Sopori, Bhushan L.},
abstractNote = {An optical cavity furnace 10 having multiple optical energy sources 12 associated with an optical cavity 18 of the furnace. The multiple optical energy sources 12 may be lamps or other devices suitable for producing an appropriate level of optical energy. The optical cavity furnace 10 may also include one or more reflectors 14 and one or more walls 16 associated with the optical energy sources 12 such that the reflectors 14 and walls 16 define the optical cavity 18. The walls 16 may have any desired configuration or shape to enhance operation of the furnace as an optical cavity 18. The optical energy sources 12 may be positioned at any location with respect to the reflectors 14 and walls defining the optical cavity. The optical cavity furnace 10 may further include a semiconductor wafer transport system 22 for transporting one or more semiconductor wafers 20 through the optical cavity.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Aug 05 00:00:00 EDT 2014},
month = {Tue Aug 05 00:00:00 EDT 2014}
}

Works referenced in this record:

Semiconductor wafer heating chamber
patent, July 1988


Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus
patent, December 1988


Dry texturing of solar cells
patent, October 1994


Impurity gettering in semiconductors
patent, June 1995


High performance multi-zone illuminator module for semiconductor wafer processing
patent, August 1995


Apparatus for making optically fused semiconductor powder for solar cells
patent, March 1997


Method for monitoring surface stress
patent, December 1997


Lid assembly for high temperature processing chamber
patent, February 2000


Furnace for rapid thermal processing with optical switching film disposed between heater and reflector
patent, April 2000


Thermally developable material
patent, July 2001


Accelerated thermal stress cycle test
patent, August 2003


Edge flaw inspection device
patent, September 2004


Method and apparatus for detecting defects along the edge of electronic media
patent, November 2004


Wafer edge polishing system
patent, January 2005


Silicon wafer and process for the heat treatment of a silicon wafer
patent, November 2010


Sensor-based orientation system
patent, August 2011


Screening of silicon wafers used in photovoltaics
patent, August 2011


Rapid thermal processing chamber for processing multiple wafers
patent-application, January 2002


Automated wafer defect inspection system and a process of performing such inspection
patent-application, January 2005


Method and its apparatus for inspecting particles or defects of a semiconductor device
patent-application, December 2005


Wafer inspection system and method thereof
patent-application, December 2005


Monitoring semiconductor wafer defects below one nanometer
patent-application, February 2006


Apparatus and method for thermal processing
patent-application, August 2006


Structure and Method for Thermally Stressing or Testing a Semiconductor Device
patent-application, October 2007


High-flux solar furnace processing of silicon solar cells
conference, January 1994

  • Tsuo, Y. S.; Pitts, J. R.; Landry, M. D.
  • Proceedings of 1994 IEEE 1st World Conference on Photovoltaic Energy Conversion - WCPEC (A Joint Conference of PVSC, PVSEC and PSEC)
  • https://doi.org/10.1109/WCPEC.1994.520186

A high throughput, noncontact system for screening silicon wafers predisposed to breakage during solar cell production
conference, June 2011


Graphic script provides quick classification of GaAs wafers
journal, March 2000


Non-destructive optical methods for assessing defects in production of Si or SiGe materials
journal, July 2004