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Title: Targets and processes for fabricating same

Abstract

In particular embodiments, the present disclosure provides targets including a metal layer and defining a hollow inner surface. The hollow inner surface has an internal apex. The distance between at least two opposing points of the internal apex is less than about 15 .mu.m. In particular examples, the distance is less than about 1 .mu.m. Particular implementations of the targets are free standing. The targets have a number of disclosed shaped, including cones, pyramids, hemispheres, and capped structures. The present disclosure also provides arrays of such targets. Also provided are methods of forming targets, such as the disclosed targets, using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is formed from a silicon wafer and then one or more sides of the mold are coated with a target material, such as one or more metals.

Inventors:
; ; ; ; ;
Issue Date:
Research Org.:
Board of Regents of the Nevada System of Higher Education, Reno, NV (USA)
Sponsoring Org.:
USDOE
OSTI Identifier:
1133937
Patent Number(s):
8750459
Application Number:
13/418,003
Assignee:
Board of Regents of the Nevada System of Higher Education (Reno, NV)
Patent Classifications (CPCs):
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
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DOE Contract Number:  
FC52-01NV14050
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY

Citation Formats

Cowna, Thomas, Malekos, Steven, Korgan, Grant, Adams, Jesse, Sentoku, Yasuhiko, and LeGalloudec, Nathalie. Targets and processes for fabricating same. United States: N. p., 2014. Web.
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Cowna, Thomas, Malekos, Steven, Korgan, Grant, Adams, Jesse, Sentoku, Yasuhiko, & LeGalloudec, Nathalie. Targets and processes for fabricating same. United States.
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Cowna, Thomas, Malekos, Steven, Korgan, Grant, Adams, Jesse, Sentoku, Yasuhiko, and LeGalloudec, Nathalie. Tue . "Targets and processes for fabricating same". United States. https://www.osti.gov/servlets/purl/1133937.
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@article{osti_1133937,
title = {Targets and processes for fabricating same},
author = {Cowna, Thomas and Malekos, Steven and Korgan, Grant and Adams, Jesse and Sentoku, Yasuhiko and LeGalloudec, Nathalie},
abstractNote = {In particular embodiments, the present disclosure provides targets including a metal layer and defining a hollow inner surface. The hollow inner surface has an internal apex. The distance between at least two opposing points of the internal apex is less than about 15 .mu.m. In particular examples, the distance is less than about 1 .mu.m. Particular implementations of the targets are free standing. The targets have a number of disclosed shaped, including cones, pyramids, hemispheres, and capped structures. The present disclosure also provides arrays of such targets. Also provided are methods of forming targets, such as the disclosed targets, using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is formed from a silicon wafer and then one or more sides of the mold are coated with a target material, such as one or more metals.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {6}
}
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