Targets and processes for fabricating same
Abstract
In particular embodiments, the present disclosure provides targets including a metal layer and defining a hollow inner surface. The hollow inner surface has an internal apex. The distance between at least two opposing points of the internal apex is less than about 15 .mu.m. In particular examples, the distance is less than about 1 .mu.m. Particular implementations of the targets are free standing. The targets have a number of disclosed shaped, including cones, pyramids, hemispheres, and capped structures. The present disclosure also provides arrays of such targets. Also provided are methods of forming targets, such as the disclosed targets, using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is formed from a silicon wafer and then one or more sides of the mold are coated with a target material, such as one or more metals.
- Inventors:
- Issue Date:
- Research Org.:
- Board of Regents of the Nevada System of Higher Education, Reno, NV (USA)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1133937
- Patent Number(s):
- 8750459
- Application Number:
- 13/418,003
- Assignee:
- Board of Regents of the Nevada System of Higher Education (Reno, NV)
- Patent Classifications (CPCs):
-
G - PHYSICS G21 - NUCLEAR PHYSICS G21B - FUSION REACTORS
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
- DOE Contract Number:
- FC52-01NV14050
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY
Citation Formats
Cowna, Thomas, Malekos, Steven, Korgan, Grant, Adams, Jesse, Sentoku, Yasuhiko, and LeGalloudec, Nathalie. Targets and processes for fabricating same. United States: N. p., 2014.
Web.
Cowna, Thomas, Malekos, Steven, Korgan, Grant, Adams, Jesse, Sentoku, Yasuhiko, & LeGalloudec, Nathalie. Targets and processes for fabricating same. United States.
Cowna, Thomas, Malekos, Steven, Korgan, Grant, Adams, Jesse, Sentoku, Yasuhiko, and LeGalloudec, Nathalie. Tue .
"Targets and processes for fabricating same". United States. https://www.osti.gov/servlets/purl/1133937.
@article{osti_1133937,
title = {Targets and processes for fabricating same},
author = {Cowna, Thomas and Malekos, Steven and Korgan, Grant and Adams, Jesse and Sentoku, Yasuhiko and LeGalloudec, Nathalie},
abstractNote = {In particular embodiments, the present disclosure provides targets including a metal layer and defining a hollow inner surface. The hollow inner surface has an internal apex. The distance between at least two opposing points of the internal apex is less than about 15 .mu.m. In particular examples, the distance is less than about 1 .mu.m. Particular implementations of the targets are free standing. The targets have a number of disclosed shaped, including cones, pyramids, hemispheres, and capped structures. The present disclosure also provides arrays of such targets. Also provided are methods of forming targets, such as the disclosed targets, using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is formed from a silicon wafer and then one or more sides of the mold are coated with a target material, such as one or more metals.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jun 10 00:00:00 EDT 2014},
month = {Tue Jun 10 00:00:00 EDT 2014}
}
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Targets and processes for fabricating same
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Targets and Processes for Fabricating Same
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Targets and Processes for Fabricating Same
patent-application, November 2012
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Works referencing / citing this record:
Targets and processes for fabricating same
patent, May 2016
- Adams, Jesse D.; Malekos, Steven; Le Galloudec, Nathalie
- US Patent Document 9,345,119