Title: Diffractive laser beam homogenizer including a photo-active material and method of fabricating the same

Abstract

A method of manufacturing a plurality of diffractive optical elements includes providing a partially transmissive slide, providing a first piece of PTR glass, and directing first UV radiation through the partially transmissive slide to impinge on the first piece of PTR glass. The method also includes exposing predetermined portions of the first piece of PTR glass to the first UV radiation and thermally treating the exposed first piece of PTR glass. The method further includes providing a second piece of PTR glass and directing second UV radiation through the thermally treated first piece of PTR glass to impinge on the second piece of PTR glass. The method additionally includes exposing predetermined portions of the second piece of PTR glass to the second UV radiation, thermally treating the exposed second piece of PTR glass, and repeating providing and processing of the second piece of PTR glass using additional pieces of PTR glass.

Inventors:

Bayramian, Andy J; Ebbers, Christopher A; Chen, Diana C

Issue Date:

2014-05-20

Research Org.:

Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Org.:

USDOE

OSTI Identifier:

1132263

Patent Number(s):

8728719

Application Number:

12/544,161

Assignee:

Lawrence Livermore National Security, LLC (Livermore, CA)

Patent Classifications (CPCs):

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

Show more

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

G02B27/0922 - {the semiconductor light source comprising an array of light emitters}
G02B27/0927 - {Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat}
G02B27/0944 - {Diffractive optical elements, e.g. gratings, holograms
G02B27/0961 - {Lens arrays
G02B5/1857 - {using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams}

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G03F7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces

Show less

DOE Contract Number:  

AC52-07NA27344

Resource Type:

Patent

Resource Relation:

Patent File Date: 2009 Aug 19

Country of Publication:

United States

Language:

English

Subject:

47 OTHER INSTRUMENTATION