RF-driven ion source with a back-streaming electron dump
Abstract
A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heating of the window, which due to said heating, might otherwise cause window damage.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1131920
- Patent Number(s):
- 8729806
- Application Number:
- 13/014,956
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
- DOE Contract Number:
- AC02-05CH11231
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2011 Jan 27
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 47 OTHER INSTRUMENTATION
Citation Formats
Kwan, Joe, and Ji, Qing. RF-driven ion source with a back-streaming electron dump. United States: N. p., 2014.
Web.
Kwan, Joe, & Ji, Qing. RF-driven ion source with a back-streaming electron dump. United States.
Kwan, Joe, and Ji, Qing. Tue .
"RF-driven ion source with a back-streaming electron dump". United States. https://www.osti.gov/servlets/purl/1131920.
@article{osti_1131920,
title = {RF-driven ion source with a back-streaming electron dump},
author = {Kwan, Joe and Ji, Qing},
abstractNote = {A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heating of the window, which due to said heating, might otherwise cause window damage.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {5}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Filamentless ion source for thin film processing and surface modification
patent, March 1993
- Davis, Mervyn Howard; Proudfoot, Gary; Bayliss, Keith H.
- US Patent Document 5,198,718
Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber
patent, March 2000
- Kennedy, William S.; Lamm, Albert; Wicker, Thomas E.
- US Patent Document 6,035,868
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna
patent, February 2003
- Collins, Kenneth S.; Rice, Michael R.; Askarinam, Eric
- US Patent Document 6,514,376
Negative ion source with external RF antenna
patent, February 2007
- Leung, Ka-Ngo; Hahto, Sami K.; Hahto, Sari T.
- US Patent Document 7,176,469
Spiral RF-Induction Antenna Based Ion Source for Neutron Generators
patent-application, March 2010
- Reijonen, Jani Petteri; Hahto, Sami K.
- US Patent Application 12/425951; 20100066252
Radio frequency-driven proton source with a back-streaming electron dump
journal, February 2010
- Ji, Q.; Sy, A.; Kwan, J. W.
- Review of Scientific Instruments, Vol. 81, Issue 2
Improvement in brightness of multicusp-plasma ion source
journal, January 2002
- Ji, Q.; Jiang, X.; King, T. -J.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 6
Multicusp ion source with external rf antenna for production of protons
journal, February 2004
- Hahto, S. K.; Hahto, S. T.; Ji, Q.
- Review of Scientific Instruments, Vol. 75, Issue 2
Experiments with planar inductive ion source meant for creation of H+ beams
journal, June 2007
- Vainionpaa, J. H.; Kalvas, T.; Hahto, S. K.
- Review of Scientific Instruments, Vol. 78, Issue 6