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Title: RF-driven ion source with a back-streaming electron dump

Abstract

A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heating of the window, which due to said heating, might otherwise cause window damage.

Inventors:
;
Issue Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1131920
Patent Number(s):
8,729,806
Application Number:
13/014,956
Assignee:
The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
AC02-05CH11231
Resource Type:
Patent
Resource Relation:
Patent File Date: 2011 Jan 27
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Kwan, Joe, and Ji, Qing. RF-driven ion source with a back-streaming electron dump. United States: N. p., 2014. Web.
Kwan, Joe, & Ji, Qing. RF-driven ion source with a back-streaming electron dump. United States.
Kwan, Joe, and Ji, Qing. Tue . "RF-driven ion source with a back-streaming electron dump". United States. https://www.osti.gov/servlets/purl/1131920.
@article{osti_1131920,
title = {RF-driven ion source with a back-streaming electron dump},
author = {Kwan, Joe and Ji, Qing},
abstractNote = {A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heating of the window, which due to said heating, might otherwise cause window damage.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {5}
}

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Works referenced in this record:

Radio frequency-driven proton source with a back-streaming electron dump
journal, February 2010

  • Ji, Q.; Sy, A.; Kwan, J. W.
  • Review of Scientific Instruments, Vol. 81, Issue 2
  • DOI: 10.1063/1.3267832

Improvement in brightness of multicusp-plasma ion source
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Multicusp ion source with external rf antenna for production of protons
journal, February 2004

  • Hahto, S. K.; Hahto, S. T.; Ji, Q.
  • Review of Scientific Instruments, Vol. 75, Issue 2
  • DOI: 10.1063/1.1642744

Experiments with planar inductive ion source meant for creation of H+ beams
journal, June 2007

  • Vainionpaa, J. H.; Kalvas, T.; Hahto, S. K.
  • Review of Scientific Instruments, Vol. 78, Issue 6
  • DOI: 10.1063/1.2742624