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Title: Polymeric matrix materials for infrared metamaterials

A polymeric matrix material exhibits low loss at optical frequencies and facilitates the fabrication of all-dielectric metamaterials. The low-loss polymeric matrix material can be synthesized by providing an unsaturated polymer, comprising double or triple bonds; partially hydrogenating the unsaturated polymer; depositing a film of the partially hydrogenated polymer and a crosslinker on a substrate; and photopatterning the film by exposing the film to ultraviolet light through a patterning mask, thereby cross-linking at least some of the remaining unsaturated groups of the partially hydrogenated polymer in the exposed portions.
Inventors:
; ;
Issue Date:
OSTI Identifier:
1129387
Assignee:
Sandia Corporation (Albuquerque, NM) SNL
Patent Number(s):
8,703,391
Application Number:
13/305,837
Contract Number:
AC04-94AL85000
Resource Relation:
Patent File Date: 2011 Nov 29
Research Org:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Works referenced in this record:

Fabrication of optical negative-index metamaterials: Recent advances and outlook
journal, May 2008

Realizing Optical Magnetism from Dielectric Metamaterials
journal, February 2012

Thiol-Ene Click Chemistry
journal, February 2010
  • Hoyle, Charles E.; Bowman, Christopher N.
  • Angewandte Chemie International Edition, Vol. 49, Issue 9, p. 1540-1573
  • DOI: 10.1002/anie.200903924