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Title: Polymeric matrix materials for infrared metamaterials

Abstract

A polymeric matrix material exhibits low loss at optical frequencies and facilitates the fabrication of all-dielectric metamaterials. The low-loss polymeric matrix material can be synthesized by providing an unsaturated polymer, comprising double or triple bonds; partially hydrogenating the unsaturated polymer; depositing a film of the partially hydrogenated polymer and a crosslinker on a substrate; and photopatterning the film by exposing the film to ultraviolet light through a patterning mask, thereby cross-linking at least some of the remaining unsaturated groups of the partially hydrogenated polymer in the exposed portions.

Inventors:
; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1129387
Patent Number(s):
8,703,391
Application Number:
13/305,837
Assignee:
Sandia Corporation (Albuquerque, NM)
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Patent File Date: 2011 Nov 29
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Dirk, Shawn M, Rasberry, Roger D, and Rahimian, Kamyar. Polymeric matrix materials for infrared metamaterials. United States: N. p., 2014. Web.
Dirk, Shawn M, Rasberry, Roger D, & Rahimian, Kamyar. Polymeric matrix materials for infrared metamaterials. United States.
Dirk, Shawn M, Rasberry, Roger D, and Rahimian, Kamyar. Tue . "Polymeric matrix materials for infrared metamaterials". United States. https://www.osti.gov/servlets/purl/1129387.
@article{osti_1129387,
title = {Polymeric matrix materials for infrared metamaterials},
author = {Dirk, Shawn M and Rasberry, Roger D and Rahimian, Kamyar},
abstractNote = {A polymeric matrix material exhibits low loss at optical frequencies and facilitates the fabrication of all-dielectric metamaterials. The low-loss polymeric matrix material can be synthesized by providing an unsaturated polymer, comprising double or triple bonds; partially hydrogenating the unsaturated polymer; depositing a film of the partially hydrogenated polymer and a crosslinker on a substrate; and photopatterning the film by exposing the film to ultraviolet light through a patterning mask, thereby cross-linking at least some of the remaining unsaturated groups of the partially hydrogenated polymer in the exposed portions.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {4}
}

Patent:

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Works referenced in this record:

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