High permeance sulfur tolerant Pd/Cu alloy membranes

Title: High permeance sulfur tolerant Pd/Cu alloy membranes

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Abstract

A method of making a membrane permeable to hydrogen gas (H.sub.2.uparw.) is disclosed. The membrane is made by forming a palladium layer, depositing a layer of copper on the palladium layer, and galvanically displacing a portion of the copper with palladium. The membrane has improved resistance to poisoning by H.sub.2S compared to a palladium membrane. The membrane also has increased permeance of hydrogen gas compared to palladium-copper alloys. The membrane can be annealed at a lower temperature for a shorter amount of time.

Inventors:: Ma, Yi Hua; Pomerantz, Natalie

Issue Date:: 2014-02-18

Research Org.:: Worcester Polytechnic Institute, Worcester, MA, USA

Sponsoring Org.:: USDOE

OSTI Identifier:: 1124795

Patent Number(s):: 8652239

Application Number:: 13/099,688

Assignee:: Worcester Polytechnic Institute (Worcester, MA)

Patent Classifications (CPCs):: C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01B - NON-METALLIC ELEMENTS

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION

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C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01B - NON-METALLIC ELEMENTS
C01B3/505 - {Membranes containing palladium}

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D2325/04 - Characteristic thickness

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C18/405 - {Formaldehyde}

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D67/0069 - {by deposition from the liquid phase, e.g. electrochemical deposition

C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01B - NON-METALLIC ELEMENTS
C01B2203/0405 - Purification by membrane separation

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D69/105 - {Support pretreatment}

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C18/165 - {Multilayered product

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D2323/08 - Specific temperatures applied

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C18/1651 - {Two or more layers only obtained by electroless plating}

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D71/022 - {Metals}

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C18/54 - Contact plating, i.e. electroless electrochemical plating

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D69/12 - Composite membranes
B01D2325/023 - Dense layer within the membrane
B01D67/0093 - {Chemical modification}

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C18/1831 - {Use of metal, e.g. activation, sensitisation with noble metals}

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DOE Contract Number:: FC26-07NT43058; FG26-04NT42194

Resource Type:: Patent

Resource Relation:: Patent File Date: 2011 May 03

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE

Citation Formats


                    Ma, Yi Hua, and Pomerantz, Natalie. High permeance sulfur tolerant Pd/Cu alloy membranes.  United States: N. p., 2014. 
        Web.

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                    Ma, Yi Hua, & Pomerantz, Natalie. High permeance sulfur tolerant Pd/Cu alloy membranes.  United States.

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                    Ma, Yi Hua, and Pomerantz, Natalie. Tue .  
        "High permeance sulfur tolerant Pd/Cu alloy membranes".  United States.  https://www.osti.gov/servlets/purl/1124795.

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@article{osti_1124795,

  title        = {High permeance sulfur tolerant Pd/Cu alloy membranes},

  author       = {Ma, Yi Hua and Pomerantz, Natalie},

  abstractNote = {A method of making a membrane permeable to hydrogen gas (H.sub.2.uparw.) is disclosed. The membrane is made by forming a palladium layer, depositing a layer of copper on the palladium layer, and galvanically displacing a portion of the copper with palladium. The membrane has improved resistance to poisoning by H.sub.2S compared to a palladium membrane. The membrane also has increased permeance of hydrogen gas compared to palladium-copper alloys. The membrane can be annealed at a lower temperature for a shorter amount of time.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2014},

  month        = {2}

}

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