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Title: Light source employing laser-produced plasma

Abstract

A system and a method of generating radiation and/or particle emissions are disclosed. In at least some embodiments, the system includes at least one laser source that generates a first pulse and a second pulse in temporal succession, and a target, where the target (or at least a portion the target) becomes a plasma upon being exposed to the first pulse. The plasma expand after the exposure to the first pulse, the expanded plasma is then exposed to the second pulse, and at least one of a radiation emission and a particle emission occurs after the exposure to the second pulse. In at least some embodiments, the target is a solid piece of material, and/or a time period between the first and second pulses is less than 1 microsecond (e.g., 840 ns).

Inventors:
;
Issue Date:
Research Org.:
Univ. of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1093377
Patent Number(s):
8536549
Application Number:
12/296,707
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
DOE Contract Number:  
FG03-99ER54547
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Tao, Yezheng, and Tillack, Mark S. Light source employing laser-produced plasma. United States: N. p., 2013. Web.
Tao, Yezheng, & Tillack, Mark S. Light source employing laser-produced plasma. United States.
Tao, Yezheng, and Tillack, Mark S. Tue . "Light source employing laser-produced plasma". United States. https://www.osti.gov/servlets/purl/1093377.
@article{osti_1093377,
title = {Light source employing laser-produced plasma},
author = {Tao, Yezheng and Tillack, Mark S},
abstractNote = {A system and a method of generating radiation and/or particle emissions are disclosed. In at least some embodiments, the system includes at least one laser source that generates a first pulse and a second pulse in temporal succession, and a target, where the target (or at least a portion the target) becomes a plasma upon being exposed to the first pulse. The plasma expand after the exposure to the first pulse, the expanded plasma is then exposed to the second pulse, and at least one of a radiation emission and a particle emission occurs after the exposure to the second pulse. In at least some embodiments, the target is a solid piece of material, and/or a time period between the first and second pulses is less than 1 microsecond (e.g., 840 ns).},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2013},
month = {9}
}

Works referenced in this record:

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journal, December 2007


Dynamics of laser-produced Sn-based plasmas for a monochromatic 13.5 nm extreme ultraviolet source
conference, September 2007


Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams
journal, January 2005


Characterization of density profile of laser-produced Sn plasma for 13.5nm extreme ultraviolet source
journal, May 2005


Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target
journal, May 2007


Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas
journal, November 2005


Soft x-ray light source device
patent, January 2002


Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas
journal, July 2005


Optimizing 13.5nm laser-produced tin plasma emission as a function of laser wavelength
journal, April 2007


Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source
journal, January 2007


Method and arrangement for producing radiation
patent, July 2007


CO 2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography
conference, September 2007


Extreme ultraviolet lithography: overview and development status
journal, January 2005


High repetition rate laser produced plasma EUV light source
patent, April 2008


High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography
journal, January 2004

  • Richardson, M.; Koay, C. -S.; Takenoshita, K.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 2
  • https://doi.org/10.1116/1.1667511

Proximity printing using extreme ultraviolet radiation
conference, April 2008


LPP EUV source development for HVM
conference, March 2007


Density and temperature profiles in strongly absorbing plasma with distributed absorption
journal, May 1991


Laser-produced plasma EUV light source with pre-pulse enhancement
patent, December 2005


Extreme-ultraviolet spectral purity and magnetic ion debris mitigation by use of low-density tin targets
journal, January 2006


Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source
journal, September 2006