Light source employing laser-produced plasma
Abstract
A system and a method of generating radiation and/or particle emissions are disclosed. In at least some embodiments, the system includes at least one laser source that generates a first pulse and a second pulse in temporal succession, and a target, where the target (or at least a portion the target) becomes a plasma upon being exposed to the first pulse. The plasma expand after the exposure to the first pulse, the expanded plasma is then exposed to the second pulse, and at least one of a radiation emission and a particle emission occurs after the exposure to the second pulse. In at least some embodiments, the target is a solid piece of material, and/or a time period between the first and second pulses is less than 1 microsecond (e.g., 840 ns).
- Inventors:
- Issue Date:
- Research Org.:
- Univ. of California, Oakland, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1093377
- Patent Number(s):
- 8536549
- Application Number:
- 12/296,707
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
- DOE Contract Number:
- FG03-99ER54547
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 47 OTHER INSTRUMENTATION
Citation Formats
Tao, Yezheng, and Tillack, Mark S. Light source employing laser-produced plasma. United States: N. p., 2013.
Web.
Tao, Yezheng, & Tillack, Mark S. Light source employing laser-produced plasma. United States.
Tao, Yezheng, and Tillack, Mark S. Tue .
"Light source employing laser-produced plasma". United States. https://www.osti.gov/servlets/purl/1093377.
@article{osti_1093377,
title = {Light source employing laser-produced plasma},
author = {Tao, Yezheng and Tillack, Mark S},
abstractNote = {A system and a method of generating radiation and/or particle emissions are disclosed. In at least some embodiments, the system includes at least one laser source that generates a first pulse and a second pulse in temporal succession, and a target, where the target (or at least a portion the target) becomes a plasma upon being exposed to the first pulse. The plasma expand after the exposure to the first pulse, the expanded plasma is then exposed to the second pulse, and at least one of a radiation emission and a particle emission occurs after the exposure to the second pulse. In at least some embodiments, the target is a solid piece of material, and/or a time period between the first and second pulses is less than 1 microsecond (e.g., 840 ns).},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2013},
month = {9}
}
Works referenced in this record:
Enhancement of extreme ultraviolet emission from a CO2 laser-produced Sn plasma using a cavity target
journal, December 2007
- Ueno, Yoshifumi; Soumagne, Georg; Sumitani, Akira
- Applied Physics Letters, Vol. 91, Issue 23
Dynamics of laser-produced Sn-based plasmas for a monochromatic 13.5 nm extreme ultraviolet source
conference, September 2007
- Tao, Y.; Tillack, M. S.; Sequoia, K. L.
- Optical Engineering + Applications, SPIE Proceedings
Extreme ultraviolet light sources for use in semiconductor lithography—state of the art and future development
journal, November 2004
- Stamm, Uwe
- Journal of Physics D: Applied Physics, Vol. 37, Issue 23
Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams
journal, January 2005
- Shimada, Y.; Nishimura, H.; Nakai, M.
- Applied Physics Letters, Vol. 86, Issue 5
Characterization of density profile of laser-produced Sn plasma for 13.5nm extreme ultraviolet source
journal, May 2005
- Tao, Y.; Nishimura, H.; Fujioka, S.
- Applied Physics Letters, Vol. 86, Issue 20
Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target
journal, May 2007
- Ueno, Yoshifumi; Ariga, Tatsuya; Soumagne, George
- Applied Physics Letters, Vol. 90, Issue 19
Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas
journal, November 2005
- Fujioka, Shinsuke; Nishimura, Hiroaki; Nishihara, Katsunobu
- Physical Review Letters, Vol. 95, Issue 23
Soft x-ray light source device
patent, January 2002
- Kandaka, Noriaki; Kondo, Hiroyuki; Owa, Soichi
- US Patent Document 6,339,634
Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas
journal, July 2005
- Tanaka, Hiroki; Matsumoto, Atsushi; Akinaga, Kouzi
- Applied Physics Letters, Vol. 87, Issue 4
Condenser for photolithography system
patent, March 2004
- Sweatt, William C.
- US Patent Document 6,700,644
Optimizing 13.5nm laser-produced tin plasma emission as a function of laser wavelength
journal, April 2007
- White, J.; Dunne, P.; Hayden, P.
- Applied Physics Letters, Vol. 90, Issue 18
Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source
journal, January 2007
- Tao, Y.; Tillack, M. S.; Harilal, S. S.
- Optics Letters, Vol. 32, Issue 10
Method and arrangement for producing radiation
patent, July 2007
- Berglund, Magnus; Hansson, Bjorn; Hemberg, Oscar
- US Patent Document 7,239,686
CO 2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography
conference, September 2007
- Endo, Akira; Abe, Tamotsu; Hoshino, Hideo
- Optical Engineering + Applications, SPIE Proceedings
Extreme ultraviolet lithography: overview and development status
journal, January 2005
- Silverman, Peter J.
- Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 4, Issue 1
High repetition rate laser produced plasma EUV light source
patent, April 2008
- Akins, Robert P.; Sandstrom, Richard L.; Partlo, William N.
- US Patent Document 7,361,918
High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography
journal, January 2004
- Richardson, M.; Koay, C. -S.; Takenoshita, K.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 2
Proximity printing using extreme ultraviolet radiation
conference, April 2008
- Garg, R.; Naulleau, P.; Brainard, R.
- SPIE Advanced Lithography, SPIE Proceedings
LPP EUV source development for HVM
conference, March 2007
- Brandt, David C.; Fomenkov, Igor V.; Ershov, Alex I.
- Advanced Lithography, SPIE Proceedings
Density and temperature profiles in strongly absorbing plasma with distributed absorption
journal, May 1991
- De Groot, J. S.; Cameron, S. M.; Mizuno, K.
- Physics of Fluids B: Plasma Physics, Vol. 3, Issue 5
Laser-produced plasma EUV light source with pre-pulse enhancement
patent, December 2005
- Hartlove, Jeffrey S.; Michaelian, Mark E.; Shields, Henry
- US Patent Document 6,973,164
Extreme-ultraviolet spectral purity and magnetic ion debris mitigation by use of low-density tin targets
journal, January 2006
- Harilal, S. S.; Tillack, M. S.; Tao, Y.
- Optics Letters, Vol. 31, Issue 10
Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source
journal, September 2006
- Tao, Y.; Tillack, M. S.
- Applied Physics Letters, Vol. 89, Issue 11