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Title: Thermochemical nanolithography components, systems, and methods

Abstract

Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.

Inventors:
; ; ; ; ; ; ; ; ; ;
Issue Date:
Research Org.:
DOESC (USDOE Office of Science (SC) (United States))
Sponsoring Org.:
USDOE
OSTI Identifier:
1084067
Patent Number(s):
8468611
Application Number:
12/791,466
Assignee:
Georgia Tech Research Corporation (Atlanta, GA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
FG02-06ER46293
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Riedo, Elisa, Marder, Seth R., de Heer, Walt A., Szoskiewicz, Robert J., Kodali, Vamsi K., Jones, Simon C., Okada, Takashi, Wang, Debin, Curtis, Jennifer E., Henderson, Clifford L., and Hua, Yueming. Thermochemical nanolithography components, systems, and methods. United States: N. p., 2013. Web.
Riedo, Elisa, Marder, Seth R., de Heer, Walt A., Szoskiewicz, Robert J., Kodali, Vamsi K., Jones, Simon C., Okada, Takashi, Wang, Debin, Curtis, Jennifer E., Henderson, Clifford L., & Hua, Yueming. Thermochemical nanolithography components, systems, and methods. United States.
Riedo, Elisa, Marder, Seth R., de Heer, Walt A., Szoskiewicz, Robert J., Kodali, Vamsi K., Jones, Simon C., Okada, Takashi, Wang, Debin, Curtis, Jennifer E., Henderson, Clifford L., and Hua, Yueming. Tue . "Thermochemical nanolithography components, systems, and methods". United States. https://www.osti.gov/servlets/purl/1084067.
@article{osti_1084067,
title = {Thermochemical nanolithography components, systems, and methods},
author = {Riedo, Elisa and Marder, Seth R. and de Heer, Walt A. and Szoskiewicz, Robert J. and Kodali, Vamsi K. and Jones, Simon C. and Okada, Takashi and Wang, Debin and Curtis, Jennifer E. and Henderson, Clifford L. and Hua, Yueming},
abstractNote = {Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2013},
month = {6}
}

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