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Title: Large-scale fabrication of vertically aligned ZnO nanowire arrays

Abstract

In a method for growing a nanowire array, a photoresist layer is placed onto a nanowire growth layer configured for growing nanowires therefrom. The photoresist layer is exposed to a coherent light interference pattern that includes periodically alternately spaced dark bands and light bands along a first orientation. The photoresist layer exposed to the coherent light interference pattern along a second orientation, transverse to the first orientation. The photoresist layer developed so as to remove photoresist from areas corresponding to areas of intersection of the dark bands of the interference pattern along the first orientation and the dark bands of the interference pattern along the second orientation, thereby leaving an ordered array of holes passing through the photoresist layer. The photoresist layer and the nanowire growth layer are placed into a nanowire growth environment, thereby growing nanowires from the nanowire growth layer through the array of holes.

Inventors:
; ; ; ; ; ;
Issue Date:
Research Org.:
Georgia Institute of Technology, Atlanta, GA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1083221
Patent Number(s):
8367462
Application Number:
13/091,855
Assignee:
Georgia Tech Research Corporation (Atlanta, GA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
DOE Contract Number:  
FG02-07ER46394
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Wang, Zhong L, Das, Suman, Xu, Sheng, Yuan, Dajun, Guo, Rui, Wei, Yaguang, and Wu, Wenzhuo. Large-scale fabrication of vertically aligned ZnO nanowire arrays. United States: N. p., 2013. Web.
Wang, Zhong L, Das, Suman, Xu, Sheng, Yuan, Dajun, Guo, Rui, Wei, Yaguang, & Wu, Wenzhuo. Large-scale fabrication of vertically aligned ZnO nanowire arrays. United States.
Wang, Zhong L, Das, Suman, Xu, Sheng, Yuan, Dajun, Guo, Rui, Wei, Yaguang, and Wu, Wenzhuo. Tue . "Large-scale fabrication of vertically aligned ZnO nanowire arrays". United States. https://www.osti.gov/servlets/purl/1083221.
@article{osti_1083221,
title = {Large-scale fabrication of vertically aligned ZnO nanowire arrays},
author = {Wang, Zhong L and Das, Suman and Xu, Sheng and Yuan, Dajun and Guo, Rui and Wei, Yaguang and Wu, Wenzhuo},
abstractNote = {In a method for growing a nanowire array, a photoresist layer is placed onto a nanowire growth layer configured for growing nanowires therefrom. The photoresist layer is exposed to a coherent light interference pattern that includes periodically alternately spaced dark bands and light bands along a first orientation. The photoresist layer exposed to the coherent light interference pattern along a second orientation, transverse to the first orientation. The photoresist layer developed so as to remove photoresist from areas corresponding to areas of intersection of the dark bands of the interference pattern along the first orientation and the dark bands of the interference pattern along the second orientation, thereby leaving an ordered array of holes passing through the photoresist layer. The photoresist layer and the nanowire growth layer are placed into a nanowire growth environment, thereby growing nanowires from the nanowire growth layer through the array of holes.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2013},
month = {2}
}

Works referenced in this record:

Nanoarchitectures of semiconducting and piezoelectric zinc oxide
journal, February 2005


Large-Size Liftable Inverted-Nanobowl Sheets as Reusable Masks for Nanolithiography
journal, September 2005


Formation of double-side teethed nanocombs of ZnO and self-catalysis of Zn-terminated polar surface
journal, January 2006