Large-scale fabrication of vertically aligned ZnO nanowire arrays
Abstract
In a method for growing a nanowire array, a photoresist layer is placed onto a nanowire growth layer configured for growing nanowires therefrom. The photoresist layer is exposed to a coherent light interference pattern that includes periodically alternately spaced dark bands and light bands along a first orientation. The photoresist layer exposed to the coherent light interference pattern along a second orientation, transverse to the first orientation. The photoresist layer developed so as to remove photoresist from areas corresponding to areas of intersection of the dark bands of the interference pattern along the first orientation and the dark bands of the interference pattern along the second orientation, thereby leaving an ordered array of holes passing through the photoresist layer. The photoresist layer and the nanowire growth layer are placed into a nanowire growth environment, thereby growing nanowires from the nanowire growth layer through the array of holes.
- Inventors:
- Issue Date:
- Research Org.:
- Georgia Institute of Technology, Atlanta, GA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1083221
- Patent Number(s):
- 8367462
- Application Number:
- 13/091,855
- Assignee:
- Georgia Tech Research Corporation (Atlanta, GA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
- DOE Contract Number:
- FG02-07ER46394
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Wang, Zhong L, Das, Suman, Xu, Sheng, Yuan, Dajun, Guo, Rui, Wei, Yaguang, and Wu, Wenzhuo. Large-scale fabrication of vertically aligned ZnO nanowire arrays. United States: N. p., 2013.
Web.
Wang, Zhong L, Das, Suman, Xu, Sheng, Yuan, Dajun, Guo, Rui, Wei, Yaguang, & Wu, Wenzhuo. Large-scale fabrication of vertically aligned ZnO nanowire arrays. United States.
Wang, Zhong L, Das, Suman, Xu, Sheng, Yuan, Dajun, Guo, Rui, Wei, Yaguang, and Wu, Wenzhuo. Tue .
"Large-scale fabrication of vertically aligned ZnO nanowire arrays". United States. https://www.osti.gov/servlets/purl/1083221.
@article{osti_1083221,
title = {Large-scale fabrication of vertically aligned ZnO nanowire arrays},
author = {Wang, Zhong L and Das, Suman and Xu, Sheng and Yuan, Dajun and Guo, Rui and Wei, Yaguang and Wu, Wenzhuo},
abstractNote = {In a method for growing a nanowire array, a photoresist layer is placed onto a nanowire growth layer configured for growing nanowires therefrom. The photoresist layer is exposed to a coherent light interference pattern that includes periodically alternately spaced dark bands and light bands along a first orientation. The photoresist layer exposed to the coherent light interference pattern along a second orientation, transverse to the first orientation. The photoresist layer developed so as to remove photoresist from areas corresponding to areas of intersection of the dark bands of the interference pattern along the first orientation and the dark bands of the interference pattern along the second orientation, thereby leaving an ordered array of holes passing through the photoresist layer. The photoresist layer and the nanowire growth layer are placed into a nanowire growth environment, thereby growing nanowires from the nanowire growth layer through the array of holes.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2013},
month = {2}
}
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