skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Method to planarize three-dimensional structures to enable conformal electrodes

Abstract

Methods for fabricating three-dimensional PIN structures having conformal electrodes are provided, as well as the structures themselves. The structures include a first layer and an array of pillars with cavity regions between the pillars. A first end of each pillar is in contact with the first layer. A segment is formed on the second end of each pillar. The cavity regions are filled with a fill material, which may be a functional material such as a neutron sensitive material. The fill material covers each segment. A portion of the fill material is etched back to produce an exposed portion of the segment. A first electrode is deposited onto the fill material and each exposed segment, thereby forming a conductive layer that provides a common contact to each the exposed segment. A second electrode is deposited onto the first layer.

Inventors:
; ; ; ; ;
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1080310
Patent Number(s):
8,314,400
Application Number:
13/014,879
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Nikolic, Rebecca J, Conway, Adam M, Graff, Robert T, Reinhardt, Catherine, Voss, Lars F, and Shao, Qinghui. Method to planarize three-dimensional structures to enable conformal electrodes. United States: N. p., 2012. Web.
Nikolic, Rebecca J, Conway, Adam M, Graff, Robert T, Reinhardt, Catherine, Voss, Lars F, & Shao, Qinghui. Method to planarize three-dimensional structures to enable conformal electrodes. United States.
Nikolic, Rebecca J, Conway, Adam M, Graff, Robert T, Reinhardt, Catherine, Voss, Lars F, and Shao, Qinghui. Tue . "Method to planarize three-dimensional structures to enable conformal electrodes". United States. https://www.osti.gov/servlets/purl/1080310.
@article{osti_1080310,
title = {Method to planarize three-dimensional structures to enable conformal electrodes},
author = {Nikolic, Rebecca J and Conway, Adam M and Graff, Robert T and Reinhardt, Catherine and Voss, Lars F and Shao, Qinghui},
abstractNote = {Methods for fabricating three-dimensional PIN structures having conformal electrodes are provided, as well as the structures themselves. The structures include a first layer and an array of pillars with cavity regions between the pillars. A first end of each pillar is in contact with the first layer. A segment is formed on the second end of each pillar. The cavity regions are filled with a fill material, which may be a functional material such as a neutron sensitive material. The fill material covers each segment. A portion of the fill material is etched back to produce an exposed portion of the segment. A first electrode is deposited onto the fill material and each exposed segment, thereby forming a conductive layer that provides a common contact to each the exposed segment. A second electrode is deposited onto the first layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2012},
month = {11}
}

Patent:

Save / Share:

Works referenced in this record:

Efficiencies of coated and perforated semiconductor neutron detectors
conference, October 2004


6:1 aspect ratio silicon pillar based thermal neutron detector filled with B10
journal, September 2008

  • Nikolić, R. J.; Conway, A. M.; Reinhardt, C. E.
  • Applied Physics Letters, Vol. 93, Issue 13, Article No. 133502
  • DOI: 10.1063/1.2985817