Method of patterning an aerogel
Abstract
A method for producing a pattern in an aerogel disposed as a coating on a substrate comprises exposing the aerogel coating to the vapors of a hydrophobic silane compound, masking the aerogel coating with a shadow photomask and irradiating the aerogel coating with ultraviolet (UV) irradiation. The exposure to UV through the shadow mask creates a pattern of hydrophobic and hydrophilic regions in the aerogel coating. Etching away the hydrophilic regions of the aerogel coating, preferably with a 1 molar solution of sodium hydroxide, leaves the unwetted and unetched hydrophobic regions of the aerogel layer on the substrate, replicating the pattern of the photomask. The hydrophobic aerogel pattern can be further exposed to UV irradiation if desired, to create a hydrophilic aerogel pattern.
- Inventors:
-
- Edgewood, NM
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1067880
- Patent Number(s):
- 8226839
- Application Number:
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Reed, Scott T. Method of patterning an aerogel. United States: N. p., 2012.
Web.
Reed, Scott T. Method of patterning an aerogel. United States.
Reed, Scott T. Tue .
"Method of patterning an aerogel". United States. https://www.osti.gov/servlets/purl/1067880.
@article{osti_1067880,
title = {Method of patterning an aerogel},
author = {Reed, Scott T},
abstractNote = {A method for producing a pattern in an aerogel disposed as a coating on a substrate comprises exposing the aerogel coating to the vapors of a hydrophobic silane compound, masking the aerogel coating with a shadow photomask and irradiating the aerogel coating with ultraviolet (UV) irradiation. The exposure to UV through the shadow mask creates a pattern of hydrophobic and hydrophilic regions in the aerogel coating. Etching away the hydrophilic regions of the aerogel coating, preferably with a 1 molar solution of sodium hydroxide, leaves the unwetted and unetched hydrophobic regions of the aerogel layer on the substrate, replicating the pattern of the photomask. The hydrophobic aerogel pattern can be further exposed to UV irradiation if desired, to create a hydrophilic aerogel pattern.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jul 24 00:00:00 EDT 2012},
month = {Tue Jul 24 00:00:00 EDT 2012}
}
Works referenced in this record:
MEMS with thin-film aerogel
conference, January 2001
- Fan, Shih-Kang; Kim, Chang-Jin; Paik, Jong-Ah
- Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)
Inorganic Materials Chemistry Desk Reference
reference-book, November 2004
- Samgeeta, D.; LaGraff, John R.
- CRC Press
Kinetics of the SiO2 aerogel dissolution in aqueous NaOH solutions: experiment and model
journal, December 1999
- Okunev, A. G.; Shaurman, S. A.; Danilyuk, A. F.
- Journal of Non-Crystalline Solids, Vol. 260, Issue 1-2