Self-assembly of block copolymers on topographically patterned polymeric substrates
Abstract
Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
- Inventors:
-
- Amherst, MA
- Berkeley, CA
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States); University of Massachusetts, Boston, MA (United States); Univ. of California, Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1062723
- Patent Number(s):
- 8247033
- Application Number:
- 12/553,484
- Assignee:
- The University of Massachusetts (Boston, MA); The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
- DOE Contract Number:
- AC02-05CH11231
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2009 Sep 03
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Russell, Thomas P, Park, Soojin, Lee, Dong Hyun, and Xu, Ting. Self-assembly of block copolymers on topographically patterned polymeric substrates. United States: N. p., 2012.
Web.
Russell, Thomas P, Park, Soojin, Lee, Dong Hyun, & Xu, Ting. Self-assembly of block copolymers on topographically patterned polymeric substrates. United States.
Russell, Thomas P, Park, Soojin, Lee, Dong Hyun, and Xu, Ting. Tue .
"Self-assembly of block copolymers on topographically patterned polymeric substrates". United States. https://www.osti.gov/servlets/purl/1062723.
@article{osti_1062723,
title = {Self-assembly of block copolymers on topographically patterned polymeric substrates},
author = {Russell, Thomas P and Park, Soojin and Lee, Dong Hyun and Xu, Ting},
abstractNote = {Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2012},
month = {8}
}