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Title: Front and backside processed thin film electronic devices

Abstract

This invention provides thin film devices that have been processed on their front- and backside. The devices include an active layer that is sufficiently thin to be mechanically flexible. Examples of the devices include back-gate and double-gate field effect transistors, double-sided bipolar transistors and 3D integrated circuits.

Inventors:
 [1];  [1];  [2];  [3];  [1];  [1]
  1. Madison, WI
  2. Middleton, WI
  3. Lakewood, CO
Issue Date:
Research Org.:
Univ. of Wisconsin, Madison, WI (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1035053
Patent Number(s):
8089073
Application Number:
US patent applicaiton 12/877,269
Assignee:
Wisconsin Alumni Research Foundation (Madison, WI)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
DOE Contract Number:  
FG02-03ER46028
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Evans, Paul G, Lagally, Max G, Ma, Zhenqiang, Yuan, Hao-Chih, Wang, Guogong, and Eriksson, Mark A. Front and backside processed thin film electronic devices. United States: N. p., 2012. Web.
Evans, Paul G, Lagally, Max G, Ma, Zhenqiang, Yuan, Hao-Chih, Wang, Guogong, & Eriksson, Mark A. Front and backside processed thin film electronic devices. United States.
Evans, Paul G, Lagally, Max G, Ma, Zhenqiang, Yuan, Hao-Chih, Wang, Guogong, and Eriksson, Mark A. Tue . "Front and backside processed thin film electronic devices". United States. https://www.osti.gov/servlets/purl/1035053.
@article{osti_1035053,
title = {Front and backside processed thin film electronic devices},
author = {Evans, Paul G and Lagally, Max G and Ma, Zhenqiang and Yuan, Hao-Chih and Wang, Guogong and Eriksson, Mark A},
abstractNote = {This invention provides thin film devices that have been processed on their front- and backside. The devices include an active layer that is sufficiently thin to be mechanically flexible. Examples of the devices include back-gate and double-gate field effect transistors, double-sided bipolar transistors and 3D integrated circuits.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 03 00:00:00 EST 2012},
month = {Tue Jan 03 00:00:00 EST 2012}
}