skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Nanostructure templating using low temperature atomic layer deposition

Abstract

Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.

Inventors:
 [1];  [2];  [3]
  1. Albuquerque, NM
  2. Corrales, NM
  3. Champaign, IL
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1034170
Patent Number(s):
8080280
Application Number:
11/872,749
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY

Citation Formats

Grubbs, Robert K, Bogart, Gregory R, and Rogers, John A. Nanostructure templating using low temperature atomic layer deposition. United States: N. p., 2011. Web.
Grubbs, Robert K, Bogart, Gregory R, & Rogers, John A. Nanostructure templating using low temperature atomic layer deposition. United States.
Grubbs, Robert K, Bogart, Gregory R, and Rogers, John A. Tue . "Nanostructure templating using low temperature atomic layer deposition". United States. https://www.osti.gov/servlets/purl/1034170.
@article{osti_1034170,
title = {Nanostructure templating using low temperature atomic layer deposition},
author = {Grubbs, Robert K and Bogart, Gregory R and Rogers, John A},
abstractNote = {Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2011},
month = {12}
}

Patent:

Save / Share:

Works referenced in this record:

Recent progress in soft lithography
journal, February 2005


Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
journal, June 2005


Fabricating three-dimensional nanostructures using two photon lithography in a single exposure step
journal, January 2006


Experimental and computational studies of phase shift lithography with binary elastomeric masks
journal, January 2006

  • Maria, Joana; Malyarchuk, Viktor; White, Jeff
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, Issue 2, Article No. 828
  • https://doi.org/10.1116/1.2184321

Fabrication of Step and Flash imprint lithography templates using commercial mask processes
conference, June 2003


Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks
journal, August 2004